Beneq TFS 200

ALD research equipment that grows with you

Beneq TFS 200 is the most flexible ALD research platform ever designed for academic research and corporate R&D. Beneq TFS 200 has specifically been designed to minimize any cross contamination that could happen in a multi-user research environment. The large number of available options and upgrades means that your Beneq TFS 200 will grow with you to meet even the most demanding research requirements.

Beneq TFS 200 represents technical solutions that enable deposition of superior quality coatings on wafers, planar objects, porous bulk materials and complex 3D objects with very high aspect ratio (HAR) features.

Direct and remote plasma-enhanced deposition (PEALD) is available in Beneq TFS 200 as a standard option. The plasma is capacitively-coupled (CCP), which is the industry standard today. The CCP plasma option offers both direct and remote plasma-enhanced ALD (PEALD) for substrates up to 200mm, face-up or face-down.

  • Process cycle time customarily less than 2 seconds. In specific cases even less than 1 second
  • High Aspect Ratio (HAR) available for structures with vias and porous substrates
  • Cold-wall vacuum chamber for rapid heating and cooling
  • Auxiliary entry ports in vacuum chamber enable plasma, in situ diagnostics etc.
  • Load lock available for rapid substrate change and integration with other equipment.


Visit our Research World pages to view our Science Letters and other research performed with Beneq equipment.

You can find more information about available options for Beneq TFS 200 on our Options and upgrades page. If you already own a Beneq TFS 200 reactor and want to get an offer for options, please fill in the Beneq TFS 200 option quote form.

Technical Specificatio

Process type
  • thermal ALD
  • plasma enhaced ALD
  • face-up and face-down
  • R&D
  • production
Substrate type
  • up to 200 mm wafer
  • up to 200 x 200 mm 3D parts
  • powder
Substrate loading
  • automatic
  • manual
Main dimensions
  • 1325 x 600 x 1298 mm
  • glove box
  • load-lock
  • cluster


 Substrate temperature range  25 - 500 °C
 Reaction chamber types and dimensions

 - single wafer:             ø200 × 18 (mm)
 - single wafer plasma:  ø200 × 18 (mm)
 - 3D/batch of wafer:     ø200 × 95 (mm)
 - customized:              by request

 Gas lines  up to 8
 Liquid sources (+5 °C to ambient)  up to 4
 Hot sources HS 300 (ambient to 300 °C)  up to 4
 Hot sources HS 500 (ambient to 500 °C)  up to 2
 Plasma option (PEALD)  - power: 300 W
 - type: capacitively coupled plasma (CCP)
 Fluidized bed particle coating option  - particle size (min.)1: 100 nm - 1 µm
 - sample volume (max.): 50 - 75 cm3
 - temperature (max.)2: 450 °C
 Control system  PLC control with PC user interface
 Main dimensions, ALD system (L × W × H)  1325 × 600 × 1298 (mm)
 Main dimensions, electric cabinet (L × W × H)  1000 × 300 × 1600 (mm)

1 particle property dependent


Contact us to learn more!

Contact Lumineq

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Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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