Beneq C2R is the spatial ALD member of our cluster-compatible equipment family.
Beneq C2R takes the Plasma Enhanced ALD (PEALD) process to a fully new level – for the first time, PEALD can be used in high volume manufacturing. Because of the plasma enhanced rotary ALD process, the Beneq C2R is ideal for thick ALD films, even up to several micrometers.
Beneq C2R provides an optimal solution for high performance ALD in industrial applications, such as optical coatings and barriers.
The Beneq C2R is the ideal product when speed, cost, low process temperature, and the highest possible film quality are the driving factors.
Ultra-high deposition rates, up to several micrometers per hour
Batch PEALD process for up to 7 pcs of 200 mm wafers
For lenses and other 3D substrates with thickness up to 30 mm
High film thickness uniformity, suitable for demanding optical coating applications
Can be equipped with a load lock or wafer automation.
The Beneq C2R features an automation option based on the trusted MX400 transfer module by Brooks Automation. Included in the automation offer:
Brooks MX400 cluster based module
Dual arm vacuum robot
Optional preheating and cooling
We were surprised by ALD’s simple adaptation to optical coatings.
The new automated cluster solutions have been designed for industrial ALD applications where high capacity is needed. The number of wafers they can process is massive compared to traditional ALD equipment.
Beneq’s high-capacity ALD solutions have enabled completely new innovative products and coatings that have not been possible in industrial scale before. The reason is simple: Beneq has taken deposition speed, capacity and throughput of ALD equipment to a completely new level. Today, we start a throughput revolution for ALD in new More than Moore wafer processing markets.
Our products for industrial customers who require low cost in high volume manufacturing include the Beneq R11 rotary ALD system and the Beneq WCS 600 Roll-to-Roll ALD system. Beneq also offers several tools for wafer processing, such as the Beneq T2S batch wafer tool.
Ever since we earlier this year announced the licensing of rotary spatial ALD technology and launched Beneq R11, our new rotary tool for plasma enhanced spatial ALD, we have received a steady flow of inquiries and questions about where we see the new equipment being the most useful.
We are introducing two new products that move the capacity of industrial ALD equipment to the next level. As Tommi says in our news release, our target is to revolutionize the coating speed standards in the ALD industry. When it comes to ALD coating throughput, m2 is the new mm2.
During the past months, there has been talk about our new exciting spatial ALD equipment, which will once again make ALD bigger, faster and more flexible. It is now time to go a little bit deeper in the details of the results of our test runs with the equipment.
Earlier today we shared news about the next solution in our spatial ALD equipment family: A new rotary spatial reactor we are developing based on technology we have licensed from Lotus Applied Technology.