Trusted research platforms for cutting edge results
From Fudan University, to the Fraunhofer Institute, to Argonne National Lab, Beneq is the largest ALD equipment
install base for universities and research institutes.
Recognized, trusted, expansive. With over 200 universities and institutes using our tools, Beneq is the most trusted supplier of ALD equipment around the world. Our solutions are recognized by the top materials scientists and academic researchers in the field. Join the largest ALD equipment install base and explore how Beneq can help elevate your research. You can read about the work our partners are completing with our tools here.
Research collaborations programs. Do you have an interesting research topic related to ALD, but lack the appropriate tool set or process expertise to carry out the work? Contact our experts and let us discuss how we may collaborate. Learn more about Beneq’s ALD-123 development process here.
Flexible configurations and modular tools. ALD researchers require a high degree of flexibility to develop and innovate thin film processes. Beneq’s research tools, like the R2 and TFS200, offer a wide range of options including plasma, batch processing, powder ALD, and reduced flow. Allow us to help you choose the best configuration for your unique development requirements.
ALD STORIES PODCAST
Please tune into our podcast, ALD Stories. Here we have a series of conversations with engineers, scientists, and innovators working to develop and commercialize ALD in notable new applications.
Beneq’s financial figures from 2016 show growth, encouraging signs of transformation, positive development in industrial ALD solutions and a strong commitment to future growth and development.
Beneq and Aalto University’s Electron Physics Group studied how Spatial ALD (SALD) can provide surface passivation of planar and black silicon (b-Si), and the results were excellent!
We’ve talked about how atomic layer deposition (ALD) coating creates a strong, uniform, and pinhole-free barrier that protects even the most complex materials from corrosion and moisture. The same ALD coating method can also be used to coat materials such as fine powders.
It’s a small world, and it’s rapidly getting smaller, especially in emerging technologies. The tiny parts of today’s nanotechnology solutions may be just barely visible, but they have mountainous differences in surface structures, with sharp edges, steep slopes, deep trenches and gate oxides concentrated in a single area.
To serve our research customers and the thin film research community better, we just launched a new research section on the Beneq Thin Film Solutions website.
Today, we would like to talk about how our expertise in high-capacity ALD is benefiting our customers in wafer research and industrial wafer-processing in markets with high throughput requirements, such as the semiconductor, MEMS and LED industries.
A very interesting doctoral dissertation in the field of semiconductor technology will be defended tomorrow in the Department of Micro- and Nanosciences of Aalto university School of Electrical Engineering.
The world is getting thinner. The never-ending quest to miniaturize and digitalize everything while saving our limited resources requires innovative technologies that allow creating ultra-thin reflecting layers, strengthening coatings, nanolaminates and protective barriers in spaces where just a few years ago nobody imagined it would be possible to operate.
On November 15, Beneq and Saint Petersburg Electrotechnical University (LETI) officially opened the ALD Application Laboratory (ALD AppLab) in St. Petersburg, Russia.
On September 4, Mordovia State University will officially open a laboratory to research and study thin-film technologies (100 nm and less) using atomic layer deposition (ALD) with Beneq’s TFS 200 equipment.
