Batch Production Equipment

Beneq P400A

ALD system that perfectly balances uniformity and throughput

Beneq coating services

The Beneq P400A is built specifically to coat different types of substrates in an optimized batch size – large enough to offer significant capacity, but small enough to maintain excellent uniformity within batches and short cycle times. Our customers use the P400A for optical coatings and applications where ALD is used on glass or metal sheets. 


Batch ALD

Just the right size. The Beneq P400A is commonly used for batches of substrates with diameters ranging from 20mm to 300mm. The batch setup is optimizable for specific parts, sheets, wafers, or other substrates. 

Total batch size for flat substrates is up to 8m2.  

Beneq P400A
Beneq P400A

Design and Setup

Every customer is unique. Allow us to select and design the optimal tool setup and ALD process to suit your substrate and application. 

The P400A’s versatile design makes it easy to switch between different setups of reaction chambers and substrate holders. This means you can transition smoothly from R&D to volume production using the same ALD system. Beneq provides tailored application development as well as pilot production support, so you can test things out before setting up your own ALD manufacturing capacity. 

Smaller Reaction Chamber for new process development
Smaller Reaction Chamber for new process development
165x25x750 mm 
Larger Reaction Chamber  for production
Larger Reaction Chamber  for production
250x250x800 mm


Thick Film Stacks 

Ideal ALD tool for thick film stacks (> 1 μm). Thick film stacks for large batches require significant amounts of precursor while producing a lot of residues and by-products. To address these challenges, the P400A is equipped with high-capacity precursor sources and precursor deactivation and filtration systems. 

The result of 35+ years of development in industrial production with large batches of >1µm thick film stacks, the Beneq P400A is reliable, 24/7. 


Oxides, nitrides, sulfides, metals, and more. Choosing the right process and precursor materials can be tricky. When to use high vs low temperatures? Are the precursor materials safe to use? 

Ask our experts to help you find just the right material or material combination for your application. The Beneq P400A can go from room temperature up to 550°C and easily handle gaseous, liquid, and solid precursors, including toxic, pyrophoric, and corrosive precursor materials. 


Simpler and less frequent maintenance. ALD tools depositing thick film stacks often require monthly cleaning. The P400A’s high-capacity pump line filter enables the tool to run for months without maintenance, even in high-volume manufacturing. 

Changing ALD reaction chambers can take a whole day due to the need for them to cool down, but the P400A cuts this down to minutes. Its design allows the operator to simply pull out the reaction chamber and other parts that require cleaning.

Beneq P400A

Multi-Chamber Design 

Avoid unnecessary downtime from maintenance. The Beneq P400A uses multiple reaction chambers that are continuously switched between each run. This allows you to minimize maintenance-related production downtime. 

Preheating Oven 

Proprietary preheater by Beneq. Our optional preheating oven shortens the heat-up time, further increasing your throughput.  

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