TFS 200R

Thin Film System TFS 200R for spatial ALD research

The Beneq TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD (CALD). The TFS 200R is used exclusively for depositing thin films on flexible substrates. For the first time in ALD history, the TFS 200R enables investigation in the dynamic behavior of various precursor chemistries, simulation of process suitability and evaluation of film performance in Roll-to-Roll ALD applications.

In the TFS 200R, the flexible substrate is fixed on a rotating cylinder within the reaction chamber. The cylinder itself is surrounded by a number of linear nozzles, each creating an isolated gas region over the full width of the substrate. As the cylinder is rotated, the substrate passes through different gas regions and is coated.

The Beneq TFS 200R, with its robust and modular structure, is designed to meet both industrial standards and the flexibility requirements of research today. Precursor containers are conveniently small, and they can be easily changed. Depending on the process needs, the TFS 200R can be equipped with up to 2 heated sources, type HS 80 and/or HS 180. Additionally, the system can be equipped with up to 8 gas lines and up to 4 liquid sources.

Performance highlights

  • Thin film deposition rate up to 100 nm/min
  • Moving substrate, web speed up to 300 m/min
  • High speed and capacity data logging as well as trend tools for human machine interface (HMI).
  • Cold-wall vacuum chamber for rapid heating and cooling
  • Auxiliary entry ports in vacuum chamber enable in situ diagnostics etc
  • Heated substrate and gas feed assembly for uniform substrate temperature and prevention of precursor condensation
  • Class 100 (ISO 5) clean-room compatibility
  • The precursor source configuration allows for easy, inert change of precursors

Technical specifications

 Process temperature range  25 - 200 °C
 Substrate size  up to 300 × 120 (mm)
 Substrate material  polymer film, metal foil or other flexible
 Web speed  up to 300 m/min (@ 1000 rpm)
 Process pressure range  1 - 900 mbar (hPa)
 Liquid sources, heated  up to 2
 Liquid sources, not heated  up to 4
 Gas lines  up to 8
 Control system  PLC control with PC user interface
 Main dimensions, ALD system (L × W × H)  1325 × 600 × 1298 (mm)
 Main dimensions, electric cabinet (L × W × H)  1000 × 300 × 1600 (mm)


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Application examples

  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq aerosol thin film equipment is ideal for AR coatings on solar glass.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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