Cross-flow precursor delivery for excellent thin film uniformity
Beneq reaction chambers support the excellence and modularity of the TFS 200 research platform.
There are two main reaction chamber groups:
- Reaction chambers loading through a manual lid
- Reaction chambers loading through gate valve (used with a load lock)
Both chamber option groups:
- Support cross-flow precursor delivery, which guarantees true ALD growth, excellent thin film uniformity and precise precursor dosing
- Are interchangeable
- Are easy to assemble
- Are quick to install
- Have optimized flow channels for minimal internal volume, high rate deposition and fast purging
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