ALD Impact on Display at Beneq-Sponsored Critical Materials Conference

Beneq is excited to be a sponsor of this year’s Critical Materials Conference on “Mission Critical Materials Keeping Pace with Chip Supply & Demand.” We will be in Chandler, AZ from April 27 to April 29 to discuss our ALD coatings for etch-resistant barriers in fab equipment, as well as our other semiconductor solutions. During the conference, we will be hosting the “ALD & Advanced Patterning” session of the Not-So-Usual Roundtable and Vice President, Sami Sneck, will give a talk titled “Enhancing yield with ALD coatings for critical chamber components” at 2:35 pm on Thursday, April 28th

This meeting is all-important as we continue to face increasing demand of chips paralleled by a component shortage, all with the backdrop of a pandemic and global conflict. We hope to contribute by providing fabs and OEMs with the purest and highest density coatings of critical chamber components, like showerheads and chucks. These anticorrosion barriers help reduce particle contamination in critical plasma processes and facilitate enhanced yield for advanced node fabs.  

Thank you to TECHCET and the Critical Materials Council for continuing to organize such an impactful event!

For the conference agenda and details on registration, click here:

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