Research with Beneq Equipment

 

20.8% industrial PERC solar cell: ALD Al2O3 rear surface passivation, efficiency loss mechanisms analysis and roadmap to 24%

Haibing Huang, Jun Lv, Yameng Bao, Rongwei Xuan, Shenghua Sun, Sami Sneck, Shuo Li, Chiara Modanese, Hele Savin, Aihua Wang, Jianhua Zhao

Solar Energy Materials and Solar Cells, Volume 161, March 2017, Pages 14–30

DOI            10.1016/j.solmat.2016.11.018

 

Realization of Al2O3/MgO laminated structure at low temperature for thin film encapsulation in organic light-emitting diodes

Min Li, Miao Xu, Jianhua Zou, Hong Tao, Lei Wang, Zhongwei Zhou and Junbiao Peng

Nanotechnology, Volume 27, Number 49

DOI            10.1088/0957-4484/27/49/494003

 

Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures

V. Tarala, M. Ambartsumov, A. Altakhov, V. Martens, M. Shevchenko

Journal of Crystal Growth, Volume 455, 1 December 2016, Pages 157–160

DOI            10.1016/j.jcrysgro.2016.10.015

 

Spatial atomic layer deposition: Performance of low temperature H2O and O3 oxidant chemistry for flexible electronics encapsulation

Philipp S. Maydannik, Alexander Plyushch, Mika Sillanpää and David C. Cameron

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 33, Issue 3

DOI            10.1116/1.4914079

 

Low temperature temporal and spatial atomic layer deposition of TiO2 films

Morteza Aghaee, Philipp S. Maydannik, Petri Johansson, Jurkka Kuusipalo, Mariadriana Creatore, Tomáš Homola and David C. Cameron

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 33, Issue 4

DOI            10.1116/1.4922588

 

Roll-to-roll atomic layer deposition process for flexible electronics applications

Maydannik, Philipp

Doctoral dissertation, Lappeenranta University of Technology

ISBN           978-952-265-804-3

 

Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

Yameng Bao, Shuo Lia, Guillaume von Gastrow, Päivikki Repo, Hele Savin and Matti Putkonen

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 33, Issue 1

DOI            10.1116/1.4901456

 

Robust Superhydrophobic Silicon without a Low Surface-Energy Hydrophobic Coating

Sasha Hoshian, Ville Jokinen, Villeseveri Somerkivi, Arcot R. Lokanathan and Sami Franssila

ACS Appl. Mater. Interfaces, 2015, 7 (1), pp 941–949

DOI            10.1021/am507584j

 

Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer deposition

Sannian Song, Dongning Yao, Zhitang Song, Lina Gao, Zhonghua Zhang, Le Li, Lanlan Shen, Liangcai Wu, Bo Liu, Yan Cheng and Songlin Feng

Nanoscale Research Letters 2015 10:89

DOI            10.1186/s11671-015-0815-5

 

Mechanical assessment of suspended ALD thin films by bulge and shaft-loading techniques

Maria Berdova, Tuomo Ylitalo, Ivan Kassamakov, Jouni Heino, Pekka T. Törmä, Lauri Kilpi, Helena Ronkainen, Jari Koskinen, Edward Hæggström and Sami Franssila

Acta Materialia, Volume 66, March 2014, Pages 370–377

DOI            10.1016/j.actamat.2013.11.024

 

Interfacial mechanical testing of atomic layer deposited TiO2 and Al2O3 on a silicon substrate by the use of embedded SiO2 microspheres

J. Lyytinen, M. Berdova, P. Hirvonen, X. W. Liu, S. Franssila, Q. Zhouc and J. Koskinen

RSC Advances, An international journal to further the chemical sciences, 2014,4

DOI            10.1039/C4RA05807K

 

Adhesion testing of atomic layer deposited TiO2 on glass substrate by the use of embedded SiO2 microspheres

Jussi Lyytinen, Maria Berdova, Sami Franssila and Jari Koskinen

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films > Volume 32, Issue 1

DOI            10.1116/1.4827197

 

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Oili M.E. Ylivaara, Xuwen Liu, Lauri Kilpi, Jussi Lyytinen, Dieter Schneider, Mikko Laitinen, Jaakko Julin, Saima Ali, Sakari Sintonen, Maria Berdova, Eero Haimi, Timo Sajavaara, Helena Ronkainen, Harri Lipsanen, Jari Koskinen, Simo-Pekka Hannula and Riikka L. Puurunen

Thin Solid Films, Volume 552, Pages 124–135

DOI            10.1016/j.tsf.2013.11.112

 

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Matti Putkonen, Markus Bosund, Oili M.E. Ylivaara, Riikka L. Puurunen, Lauri Kilpi, Helena Ronkainen, Sakari Sintonen, Saima Ali, Harri Lipsanen, Xuwen Liu, Eero Haimi, Simo-Pekka Hannula, Timo Sajavaara, Iain Buchanan, Eugene Karwacki, Mika Vähä-Nissi

Thin Solid Films, Volume 558, Pages 93–98

DOI            10.1016/j.tsf.2014.02.087

 

Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications

Philipp S. Maydannik, Tommi O. Kääriäinen, Kimmo Lahtinen, David C. Cameron, Mikko Söderlund, Pekka Soininen. Petri Johansson. Jurkka Kuusipalo, Lorenza Moro and Xianghui Zeng

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 32, Issue 5

DOI            10.1116/1.4893428

 

Low temperature plasma assisted atomic layer deposition in nitrogen carrier gas studied by optical emission spectroscopy

Sanna T. Lehti

Eur. Phys. J. D (2013) 67: 82.

DOI            10.1140/epjd/e2013-30428-8

 

Nitridation of atomic-layer-deposited HfO2/Al2O3 stacks by NH3 annealing

Jian-Shuang Liu, Yang Geng, Lin Chen, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu and David Wei Zhang

Thin Solid Films, Volume 529, Pages 230–233

DOI            10.1016/j.tsf.2012.03.066

 

Barrier height estimation of asymmetric metal-insulator-metal tunneling diodes

E. William Cowell III, Sean W. Muir, Douglas A. Keszler and John F. Wager

Journal of Applied Physics, Volume 114, Issue 21

DOI            10.1063/1.4839695

 

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

Alexander Perros, Markus Bosund, Timo Sajavaara, Mikko Laitinen, Lauri Sainiemi, Teppo Huhtio, and Harri Lipsanen

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Volume 30, Issue 1

DOI            10.1116/1.3664306

 

The importance of the majority carrier polarity and p-n junction in titanium dioxide films to their photoactivity and photocatalytic properties

M.-L. Kääriäinen and D.C. Cameron

Surface Science, Volume 606, Issues 3–4, Pages L22–L25

DOI            10.1016/j.susc.2011.11.009

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