Research with Beneq Equipment
Residual chlorine in TiO2 films groan at low temperatures by plasma enhanced atomic layer deposition
Iva Saric, Robert Peter, Ivna Kavre Piltaver, Ivana Jelovica Badovinac, Kresimir Salamon, Mladen Petravic
20.8% industrial PERC solar cell: ALD Al2O3 rear surface passivation, efficiency loss mechanisms analysis and roadmap to 24%
Haibing Huang, Jun Lv, Yameng Bao, Rongwei Xuan, Shenghua Sun, Sami Sneck, Shuo Li, Chiara Modanese, Hele Savin, Aihua Wang, Jianhua Zhao
Realization of Al2O3/MgO laminated structure at low temperature for thin film encapsulation in organic light-emitting diodes
Min Li, Miao Xu, Jianhua Zou, Hong Tao, Lei Wang, Zhongwei Zhou and Junbiao Peng
Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
V. Tarala, M. Ambartsumov, A. Altakhov, V. Martens, M. Shevchenko
Spatial atomic layer deposition: Performance of low temperature H2O and O3 oxidant chemistry for flexible electronics encapsulation
Philipp S. Maydannik, Alexander Plyushch, Mika Sillanpää and David C. Cameron
Low temperature temporal and spatial atomic layer deposition of TiO2 films
Morteza Aghaee, Philipp S. Maydannik, Petri Johansson, Jurkka Kuusipalo, Mariadriana Creatore, Tomáš Homola and David C. Cameron
Roll-to-roll atomic layer deposition process for flexible electronics applications
Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality
Yameng Bao, Shuo Lia, Guillaume von Gastrow, Päivikki Repo, Hele Savin and Matti Putkonen
Robust Superhydrophobic Silicon without a Low Surface-Energy Hydrophobic Coating
Sasha Hoshian, Ville Jokinen, Villeseveri Somerkivi, Arcot R. Lokanathan and Sami Franssila
Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer deposition
Sannian Song, Dongning Yao, Zhitang Song, Lina Gao, Zhonghua Zhang, Le Li, Lanlan Shen, Liangcai Wu, Bo Liu, Yan Cheng and Songlin Feng
Mechanical assessment of suspended ALD thin films by bulge and shaft-loading techniques
Maria Berdova, Tuomo Ylitalo, Ivan Kassamakov, Jouni Heino, Pekka T. Törmä, Lauri Kilpi, Helena Ronkainen, Jari Koskinen, Edward Hæggström and Sami Franssila
Interfacial mechanical testing of atomic layer deposited TiO2 and Al2O3 on a silicon substrate by the use of embedded SiO2 microspheres
J. Lyytinen, M. Berdova, P. Hirvonen, X. W. Liu, S. Franssila, Q. Zhouc and J. Koskinen
Adhesion testing of atomic layer deposited TiO2 on glass substrate by the use of embedded SiO2 microspheres
Jussi Lyytinen, Maria Berdova, Sami Franssila and Jari Koskinen
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Oili M.E. Ylivaara, Xuwen Liu, Lauri Kilpi, Jussi Lyytinen, Dieter Schneider, Mikko Laitinen, Jaakko Julin, Saima Ali, Sakari Sintonen, Maria Berdova, Eero Haimi, Timo Sajavaara, Helena Ronkainen, Harri Lipsanen, Jari Koskinen, Simo-Pekka Hannula and Riikka L. Puurunen
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Matti Putkonen, Markus Bosund, Oili M.E. Ylivaara, Riikka L. Puurunen, Lauri Kilpi, Helena Ronkainen, Sakari Sintonen, Saima Ali, Harri Lipsanen, Xuwen Liu, Eero Haimi, Simo-Pekka Hannula, Timo Sajavaara, Iain Buchanan, Eugene Karwacki, Mika Vähä-Nissi
Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications
Philipp S. Maydannik, Tommi O. Kääriäinen, Kimmo Lahtinen, David C. Cameron, Mikko Söderlund, Pekka Soininen. Petri Johansson. Jurkka Kuusipalo, Lorenza Moro and Xianghui Zeng
Low temperature plasma assisted atomic layer deposition in nitrogen carrier gas studied by optical emission spectroscopy
Sanna T. Lehti
Nitridation of atomic-layer-deposited HfO2/Al2O3 stacks by NH3 annealing
Jian-Shuang Liu, Yang Geng, Lin Chen, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu and David Wei Zhang
Barrier height estimation of asymmetric metal-insulator-metal tunneling diodes
E. William Cowell III, Sean W. Muir, Douglas A. Keszler and John F. Wager
Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
Alexander Perros, Markus Bosund, Timo Sajavaara, Mikko Laitinen, Lauri Sainiemi, Teppo Huhtio, and Harri Lipsanen
The importance of the majority carrier polarity and p-n junction in titanium dioxide films to their photoactivity and photocatalytic properties
M.-L. Kääriäinen and D.C. Cameron
Encapsulation of OLED microdisplaysBeneq developed a thin-film encapsulation nanolaminate coating for a leading Asian OLED microdisplay manufacturer to enable long lifetime for their microdisplays.
Insulator for thin film electroluminescent displaysAn ALD nanolaminate film was developed for Lumineq displays to create a fully pin-hole free thin film insulator layer.
Top electrode for transparent displayBeneq developed an ALD Transparent Conductive Oxide (TCO) for Lumineq's electroluminescent displays to replace the sputtered IDO that was used in the transparent top electrode.
Moisture protection of PCBsBeneq developed a low-temperature ALD moisture barrier solution for a leading supplier of electronics for personal safety monitoring to protect the sensitive circuit board components from moisture.
Encapsulation of phosphor powderBeneq provided a moisture barrier solution using ALD for FBR (fluidized-bed reactor) for a leading phosphor material manufacturer to protect the sensitive phosphor powders used in LED lighting from moisture.
Anti-corrosion coating for LED packagingBeneq's ALD coating solution solved a leading LED manufacturer's silver reflector corrosion problem by both applying ALD to coat the semi-finished wire-bonded LED assemblies, and by protecting the silver surface with nSilver.
Anti-reflection coating for solar glassBeneq and DSM created a production scale solution using DSM AR coating material and Beneq nFOG aerosol technology for a leading solar glass manufacturer to reduce light reflection on solar panels.
Metal-like coatings for watch partsBeneq developed a thin ALD-based optical coating for a leading watch parts manufacturer to both provide a specific color and to protect from corrosion.
Wafer-level moisture barrier for LEDBeneq provided moisture coating using TFS 200 for a leading LED manufacturer to protect LED dies from moisture and prevent oxidation.
Bottom DBR for LEDBeneq developed a multi-layer DBR structure on a patterned surface for a leading LED manufacturer.
Filling of diffractive gratingsBeneq used ALD coating to fill diffractive gratings for a leading optical system manufacturer to keep the gratings free from debris and boost their optical performance.
Anti-corrosion coating for sensorsThe highly conformal and pin-hole free ALD coating solved a leading sensor manufacturer's sensor corrosion problems without compromising sensor sensitivity.
Buffer layer for CIGS solar panelBeneq developed a thin, cadmium-free ALD buffer for the solar panels of a leading CGIS solar panel manufacturer.
Diffusion barrier for Li-ion batteriesBeneq's ultra-thin ALD coating solved a leading Li-ion battery manufacturer's battery corrosion challenges by reducing the fading of battery capacity caused by repeated charge and unload cycles.
Anti-tarnishing coating for jewelryBeneq helped Kalevala Jewelry in preventing the discoloration of silver surfaces by providing the patented nSilver industrial-scale protection solution for an ultra-thin, totally conformal, and fully transparent anti-tarnish coating.
Optical NIR filter on a glass cylinderBeneq developed a customized batch ALD process for a CCD sensor -based industrial vision systems supplier to coat their near-infrared (NIR) filters.
Optical coatings for lenses in high power lasersBenq developed a conformal high- and low-index multilayer optical coating for a leading provider of high power laser optics and coatings using the TFS 500 batch ALD system.
Coating of Microchannel Plates (MCP)Beneq developed an ALD coating solution for microchannel plates (MCP) for Incom, Inc., the world’s largest supplier of rigid fused fiber optics, to allow for significantly greater secondary electron emission .
Thin-film encapsulation of OLED lightingBeneq developed a conformal, dense, and pinhole-free Al2O3 and TiO2 barrier coating for a leading OLED lighting panel manufacturer to protect OLED panels from humidity.
Thin-film encapsulation of scintillator plates for X-ray imagingBeneq developed a conformal, dense, and pinhole-free low temperature Al2O3 and TiO2 barrier coating for a leading scintillator plate manufacturer to protect scintillator materials from moisture and increase product lifetime and reliability.