Flexibility though easy use of multiple chemistries
The hot source HS 500 options support the versatility and modularity of the TFS 200 research platform in the following ways:
- Excellent for ALD precursor chemistry research
- Enables use of precursors with very low vapor pressure (e.g. HfCl4, ZrCl4, beta-diketonates, amides, cyclopentadienyl, etc.)
- Small precursor quantities
- Easy and fast precursor filling and fast heating time
- Hot source HS 500 enables the use of precursors and processes that require higher temperatures than the HS 300 can accommodate
- Fast precursor loading and unloading