For depositing precursors with low vapor pressure
The hot source HS 300 options support the versatility and modularity of the Beneq TFS 200 research platform in the following ways:
- enable the use of more precursors and processes
- are necessary when depositing precursors with low vapour pressure
- almost all liquid and solid precursors can be used with HS 300 (e.g., HfCl4, ZrCl4, beta-diketonates, amides, cyclopentadienyl, etc.)
- processes MgO, HfO2, SiO2, Ta2O5, ZrO2
- high evaporation area as well as load-and-release mode allow lowest possible precursor temperature
- minimal precursor decomposition
- Large volume container, max. filling 400 ml, with manual input and output valves
- Three heated zones design