For demanding high aspect ratio substrates
Beneq offers a series of reaction chambers specifically designed for coating demanding high aspect ratio (HAR) substrates. From surfaces with curves and holes to the most demanding HAR imaginable, you can control the precursor dwelling time without limits.
With the HAR chamber option, you get:
- coating inside nanotubes, filters, ceramics and pores
- no cross-contamination
- true stop flow
- different gas flow configuration options
- easy maintenance of reaction chambers
Read more about atomic layer deposition (ALD) for high aspect ratio (HAR) structures.
Or watch a video about Beneq TFS 200 with a HAR option at University of Pardubice.