Batch Production Equipment

Beneq P1500

Thin film system for industrial production

P1500

Manual

Substrate Loading

Production

Usage

Thermal ALD

Process type

Stand-alone

Integration

Process type
Thermal ALD
Usage
Production
Substrate type
Glass and metal sheets
3D parts
Substrate loading
Manual
Main dimensions
6195 × 2480 × 2600 mm
Integration
Stand-alone

Comparison

P-Series

Product P400A P800 P1500
Process temperature range 25 – 550 °C 25 – 550 °C 25 – 400 °C
Vacuum chamber dimensions ø400 mm ø800 mm W:1700 mm
Reaction chamber types and dimensions Application specific, substrate space, e.g.: – 240 × 240 × 720 mm, with 23 shelf cassette – 370 × 470 x 25 mm, with 2 shelf cassette Application specific, substrate space, e.g.,: – 550 × 310 × 700 mm – 380 × 380 x 900 mm, – 730 x 1200 x 10 mm Application specific, substrate space, e.g.: 1300 × 2400 × 750 mm
Precursor sources 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible. 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible. 4 liquid sources, 2 heated sources, and 2 gas sources with max source capacity of 16.2 L
Control system PLC control with PC user interface PLC control with PC user interface PLC control with PC user interface
Main dimensions (L × W × H) 2400 × 930 × 2420 (mm) 3200 × 1340 × 2460 (mm) 6195 × 2480 × 2600 (mm)
Product P400A
Process temperature range 25 – 550 °C
Vacuum chamber dimensions ø400 mm
Reaction chamber types and dimensions Application specific, substrate space, e.g.: – 240 × 240 × 720 mm, with 23 shelf cassette – 370 × 470 x 25 mm, with 2 shelf cassette
Precursor sources 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
Control system PLC control with PC user interface
Main dimensions (L × W × H) 2400 × 930 × 2420 (mm)
Product P800
Process temperature range 25 – 550 °C
Vacuum chamber dimensions ø800 mm
Reaction chamber types and dimensions Application specific, substrate space, e.g.,: – 550 × 310 × 700 mm – 380 × 380 x 900 mm, – 730 x 1200 x 10 mm
Precursor sources 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
Control system PLC control with PC user interface
Main dimensions (L × W × H) 3200 × 1340 × 2460 (mm)
Product P1500
Process temperature range 25 – 400 °C
Vacuum chamber dimensions W:1700 mm
Reaction chamber types and dimensions Application specific, substrate space, e.g.: 1300 × 2400 × 750 mm
Precursor sources 4 liquid sources, 2 heated sources, and 2 gas sources with max source capacity of 16.2 L
Control system PLC control with PC user interface
Main dimensions (L × W × H) 6195 × 2480 × 2600 (mm)
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