CMOS image sensor market continues to grow steadily, driven by consumer electronics. Mass market adoption of wafer level optics, advanced 3D integration, and the perennial need for improved sensor responsivity. This creates demand for several thin-film deposition methods, grouped by functionality: (A) barrier coating (B) surface passivation and (C) anti-reflection coating.
Join the conversation this Thursday, Oct-8, as Beneq’s Mikko Söderlund will discuss Atomic Layer Deposition as a unique solution to meet the thin-film deposition demands of CMOS image sensors.
The webcast will consist of three parts:
- Yole Développement will provide a Market and Technology brief, reviewing current trends for smartphone cameras.
- System Plus Consulting will present a reverse costing brief, with the latest evolution of cameras in flagship smartphones and the main players’ technical choices.
- Beneq, our invited company, will presentAtomic Layer Deposition as a uniquely qualified solution to meet advances in wafer level optics, advanced 3D integration, and the perennial need for improved sensor responsivity.
Beneq is the home of ALD, offering a wide portfolio of equipment products and development services. Today Beneq leads the market with innovative solutions for advanced R&D (TFS 200, R2), flexible high-volume manufacturing (BENEQ TransformTM), ultra-fast high precision spatial ALD coatings (C2R), roll-to-roll thin film coating of continuous webs (WCS 600), and specialized batch production for thicker film stacks (P400, P800). Headquartered in Espoo, Finland Beneq is dedicated to making ALD technology accessible for researchers and enabling technology mega trends through engineered ALD materials solutions.