Beneq is relocating its office in the United States to Boulder, Colorado, as of October 1, 2021.  

Beneq, the home of ALD, is relocating its US branch from Duluth, Georgia to Boulder, Colorado. The new office will be situated at 4770 Baseline Road suite 200, Boulder, CO, 80303, and it will commence operations on October 1, 2021.  

The relocation of the US branch is not expected to impact the services or products Beneq provides to its customers. Partnerships with suppliers will also remain unchanged. “The aim of the relocation is to better serve our customers and strengthen Beneq’s capabilities as an ALD equipment and service provider in the US” says Tommi Kääriäinen, President of Beneq, Inc.  

A leading supplier of production and research equipment for thin film coatings, Beneq offers a wide portfolio of equipment products and development services. The company is dedicated to making atomic layer deposition (ALD) technology accessible for researchers and enabling technology megatrends through engineered ALD materials solutions. 

The company is headquartered in Espoo, Finland, and has offices in Japan and China, as well as in the US.  

For further information, please contact:   

Tommi Kääriäinen, President of Beneq, Inc., tommi.kaariainen@beneq.com or (+1) 720 757 6020 

For more news on Beneq go to: https://beneq.com/en/newsroom/ 

About Beneq  

Beneq is the home of atomic layer deposition. In 1984 we started the world’s first industrial production using ALD. Today Beneq leads the market with products for R&D (TFS 200, TFS 500, R2), semiconductor device fabrication (TransformTM), 3D and batch production (P400A, P800, P1500), ultra-fast spatial ALD (C2R), and roll-to-roll ALD (Genesis). Beneq’s unique Development Service simplifies customer adoption and proof-of-concept of new ALD processes. Our Coating Service cuts down time to market by outsourcing state-of-art ALD production. Beneq’s team of engineers and experts are dedicated to making ALD tools accessible for researchers and enabling technology mega trends through ALD.