For controlled gaseous precursors pulsing
Thermal gas lines enable gaseous precursors such as NH3, H2S, and SiH4 being pulsed into the ALD reaction chamber in a controlled way.
The thermal gas line options support the excellence and modularity of the TFS 200 research platform:
- Different gas line options are available for any ALD compatible gaseous precursor
- Gas line options include the necessary additional hardware and software
- Depending on the precursor type, there are two levels of safety for thermal gas line options available (non-hazardous or flammable/toxic)
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