Manual
Substrate Loading
Production
Usage
Thermal ALD
Process type
Stand-alone
Integration
Process type
Thermal ALD
Usage
Production
Substrate type
Wafers
Glass and metal sheets
3D parts
Substrate size: 370 x 470 mm
Substrate loading
Manual
Main dimensions
2400 x 930 x 2420 mm
Integration
Stand-alone
Comparison
P-Series
Product
P400A
P800
P1500
Process temperature range
25 – 550 °C
25 – 550 °C
25 – 400 °C
Vacuum chamber dimensions
ø400 mm
ø800 mm
W: 1700 mm
Reaction chamber types and dimensions
Application specific, substrate space, e.g.: – 240 × 240 × 720 mm, with 23 shelf cassette – 370 × 470 x 25 mm, with 2 shelf cassette
Application specific, substrate space, e.g.,: – 550 × 310 × 700 mm – 380 × 380 x 900 mm, – 730 x 1200 x 10 mm
Application specific, substrate space, e.g.: 1300 × 2400 × 750 mm
Precursor sources
5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
4 liquid sources, 2 heated sources, and 2 gas sources with max source capacity of 16.2 L
Control system
PLC control with PC user interface
PLC control with PC user interface
PLC control with PC user interface
Main dimensions (L × W × H)
2400 × 930 × 2420 (mm)
3200 × 1340 × 2460 (mm)
6195 × 2480 × 2600 (mm)
Product
P400A
Process temperature range
25 – 550 °C
Vacuum chamber dimensions
ø400 mm
Reaction chamber types and dimensions
Application specific, substrate space, e.g.: – 240 × 240 × 720 mm, with 23 shelf cassette – 370 × 470 x 25 mm, with 2 shelf cassette
Precursor sources
5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
Control system
PLC control with PC user interface
Main dimensions (L × W × H)
2400 × 930 × 2420 (mm)
Product
P800
Process temperature range
25 – 550 °C
Vacuum chamber dimensions
ø800 mm
Reaction chamber types and dimensions
Application specific, substrate space, e.g.,: – 550 × 310 × 700 mm – 380 × 380 x 900 mm, – 730 x 1200 x 10 mm
Precursor sources
5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible.
Control system
PLC control with PC user interface
Main dimensions (L × W × H)
3200 × 1340 × 2460 (mm)
Product
P1500
Process temperature range
25 – 400 °C
Vacuum chamber dimensions
W: 1700 mm
Reaction chamber types and dimensions
Application specific, substrate space, e.g.: 1300 × 2400 × 750 mm
Precursor sources
4 liquid sources, 2 heated sources, and 2 gas sources with max source capacity of 16.2 L
Control system
PLC control with PC user interface
Main dimensions (L × W × H)
6195 × 2480 × 2600 (mm)