Welcome to the Beneq quarterly newsletter, where we share the latest news, insights, and updates on our innovations. Stay informed on how Beneq continues to drive advancements in Atomic Layer Deposition (ALD) and its impact across industries.
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Welcome to the Beneq quarterly newsletter, where we share the latest news, insights, and updates on our innovations. Stay informed on how Beneq continues to drive advancements in Atomic Layer Deposition (ALD) and its impact across industries.
Beneq is honored to be chairing the marketing campaign of the semiconductor branch group (Puolijohdetoimialaryhmä) for 2025. This involves a strategic campaign (Without Us) to encourage more workforce to join the semiconductor industry in Finland. Learn more about the Without Us campaign below.
Beneq is proud to be part of the ARMS project, a Horizon Europe initiative under the Graphene Flagship. The Atomic layer-coated graphene electrode-based Micro-flexible and Structural supercapacitors (ARMS) project focuses on developing eco-friendly supercapacitors that offer energy densities exceeding 50 Wh/kg—comparable to batteries—without sacrificing power density, cycle life, or sustainability. Read more on our battery technology page. |
Introducing the world’s fastest commercial ALD system. The C2R™ delivers coating speeds of up to 2000 nm/h or 0.55 nm/s, offering a 20x increase over conventional ALD deposition rates. This remarkable speed is achieved through its spatial ALD design, with a maximum rotation speed of 200 rpm and an ALD cycle time of just 300 ms. The substrate-to-precursor exposure time is approximately 30 ms, ensuring rapid, efficient deposition.
Beneq is proud to announce that we have been awarded the ISO 9001:2015 certification, a globally recognized standard for quality management systems. This certification highlights our commitment to delivering excellence in the sales, development, manufacturing, and after-sales services of ALD equipment.