Plasma-enhanced ALD (PEALD)

With plasma-enhanced ALD (PEALD) options for TFS 200, you get:

  • enhanced processes such as TiN, SiO2, Al2O3 and SiN
  • low temperature deposition
  • high-speed processing
  • high uniformity
  • less impurities and extremely low particle level, added particles in the range of ten added particles for 200 mm wafer deposition of both conductive and insulating films
  • the possibility to run thermal deposition even with plasma head in place
  • capacitively coupled plasma (CCP) with showerhead and the freedom to use direct or remote mode with the same plasma head
  • uniform temperature in the entire reaction chamber and plasma head area, which ensures true ALD and low particle depositions
  • hot spots eliminated in the design
  • high temperature version available, up to 450 °C

Please note that either a manual substrate loader with a manual load lock, or an automatic load lock with an automatic loader are needed when the TFS 200 is equipped with the plasma option.


Plasma options PO-200 and PO-200-HT

TFS 200 Premium with
plasma ahead PH-200 visible


  • for up to 200 mm round wafers
  • excellent uniformity
  • crossflow precursor delivery
  • reaction chamber material aluminum or stainless steel
  • includes plasma head PH-200, plasma matching box, plasma generator, plasma carrier gas line with mass flow controller (MFC) and plasma generator rack
  • up to 450 °C deposition temperatures
  • plasma reaction chamber must be added separately
  • plasma gas lines must be added separately
  • substrate loading from side, manual loader or load-lock must be inculded  
  • PO-200-HT: for processes where high temperature is needed. Maximum temperature 450 °C.


Contact Lumineq

4 + 15 =
Solve this simple math problem and enter the result. E.g. for 1+3, enter 4.

Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

Proceed to download

7 + 12 =
Solve this simple math problem and enter the result. E.g. for 1+3, enter 4.