Hot source HS 500
For using precursors with very low vapor pressure.
Flexibility though easy use of multiple chemistries
The hot source HS 500 options support the versatility and modularity of the TFS 200 research platform in the following ways:
- Excellent for ALD precursor chemistry research
- Enables use of precursors with very low vapor pressure (e.g. HfCl4, ZrCl4, beta-diketonates, amides, cyclopentadienyl, etc.)
- Small precursor quantities
- Easy and fast precursor filling and fast heating time
- Hot source HS 500 enables the use of precursors and processes that require higher temperatures than the HS 300 can accommodate
- Fast precursor loading and unloading
Hot source HS 500
- for low vapor pressure liquids and solids
- enables precursor heating up to 500°C
- heated delivery line prevents precursor condensation
- very easy precursor change
- 5 ml glass crucible included
- water-cooled casing for safety
- for corrosive high-temperature processes a stainless steel reaction chamber is needed.
Precursor crucible for HS 500
- Container for precursor chemical
- Two material options, borosilicate glass and quartz
- HS-500-PC/B: Material borosilicate glass, up to 350 °C
- HS-500-PC/Q: Material Quartz, up to 500 °C
