Monitor ultra-thin films in nm scale

An integrated ellipsometer offers the best possible metrology for measuring ultra-thin films for advanced ALD applications in nanometer scale. Now the ellipsometer can be installed also as an upgrade to an existing TFS 200 ALD tool. This is achieved by installing a load-lock with ports for ellipsometer measurement heads on the existing TFS 200.

In new TFS 200 products, the ellipsometer is integrated directly to a vacuum chmaber allowing true in-situ measurements.


Ellipsometer Load-Lock enables a Film Sense FS1 or Woollam iSE ellipsometer cost-efficient integration to your existing TFS 200 ALD tool. This makes it possible to monitor film growth without breaking the vacuum conditions during measurement.

This upgrade offers a completely new dimension for studying  the ALD film growth.

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