Reaction chambers

Beneq reaction chambers support the excellence and modularity of the TFS 200 research platform.

There are two main reaction chamber groups:

  1. Reaction chambers with loading through manual lid
  2. Reaction chambers with loading through gate valve (used with load lock)

Both chamber option groups:

  • Support cross-flow precursor delivery, which guarantees true ALD growth, excellent thin film uniformity and precise precursor dosing
  • Are interchangeable
  • Are easy to assemble
  • Are quick to install
  • Have optimized flow channels for minimal internal volume, high rate deposition and fast purging

 

Standard reaction chambers

Reaction chambers RC-200/18 AL and  RC-200/18 SS

  • For single wafers and flat samples
  • Max. substrate dimensions: diam. 200 mm, height 18 mm
  • Optimised for high deposition rate and excellent uniformity
  • Cross-flow precursor delivery
  • Material options aluminum (RC-200/18 AL) , stainless steel (RC-200/18 SS) or titanium
  • RC-200/18 AL recommended max temperature for continuous use 350 °C
  • RC-200/18 SS maximum temperature 500 °C

Reaction chambers RC-200/95 AL and RC-200/95 SS

RC 200/95 AL
  • For wafer batch or 3D samples
  • Diameter 200 mm, height 95 mm
  • Optimised for high deposition rate
  • Cross-flow precursor delivery
  • Maximum wafer diameter 200 mm
  • Customized substrate rack available as option
  • Wafer cassette for 25 wafers available
  • Material options aluminum (RC-200/95 AL) or stainless steel (RC-200/95 SS)
  • RC-200/95 AL recommended max temperature for continuous use 350 °C
  • RC-200/95 SS maximum temperature 500 °C

 

Wafer casettes for batch reaction chambers

Wafer cassette

WC-100/25, WC-150/25 and WC-200/25

  • For 25 wafer batches (maximum)
  • Used with reaction chamber RC-200/95
  • Material: aluminum
  • Max recommended temperature 350 °C
  • WC-100/25 for 100 mm wafers (diameter)
  • WC-150/25 for 150 mm wafers
  • WC-200/25 for 200 mm wafers

 

Load lock reaction chambers

 

LL-RC-200/18 AL and LL-RC-200/18 SS

  • for single round wafers and flat samples with 200 mm wafer adapter
  • maximum substrate diameter 200 mm, height 18 mm
  • optimised for high deposition rate and excellent uniformity
  • cross-flow precursor delivery
  • material aluminum (RC-200/95 AL) or stainless steel (RC-200/95 SS)
  • RC-200/95 AL recommended max temperature for continuous use 350 °C
  • RC-200/95 SS maximum temperature 500 °C

LL-RC-200x200

  • for regtangular single 200 × 200 mm flat glass substrates
  • substrate thickness 1...6 mm (with adapter)
  • excellent for particle sensitive depositions
  • available for face-down processing also!
  • optimised for high deposition rate and excellent uniformity
  • cross-flow precursor delivery
  • material aluminum and stainless steel
  • requires z-axis movement from loader
  • maximum recommended temperature 200 °C

 

 

 

Contact Lumineq

2 + 12 =
Solve this simple math problem and enter the result. E.g. for 1+3, enter 4.

Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

Proceed to download

6 + 5 =
Solve this simple math problem and enter the result. E.g. for 1+3, enter 4.