Liquid source

Beneq’s liquid source options support the versatility and modularity of the Beneq TFS 200 research platform. With multiple liquid sources, you can run more processes simultaneously. Dedicated precursor sources and lines improve efficiency, reduce maintenance work and prevent cross-contamination.

Beneq TFS 200 can accommodate a maximum of four liquid source lines.

All of our liquid source options include

  • a liquid source container (container type chosen separately)
  • integration with gas delivery unit (GDU)
  • standard tubing, needle valve (if chosen) and pulsing valves
  • software upgrade
  • testing and documentation
  • commissioning by Beneq personnel

Our liquid sources are available in two different configurations

  • liquid source with a single output from a vessel
  • liquid source with a dual line setup (output and boosting nitrogen input)

Liquid source line with boosting functionality LS-BL

For low vapour pressure liquid precursors (BTBAS, 3DMAS, TEGA, etc.)

Includes:

  • two pneumatic pulsing valves: one for purge gas, the other for chemical supply
  • high precision needle valve for pulse adjustment
  • orbital welded stainless steel tubing with VCR® (Swagelok) fittings
  • aluminum liquid source container holder cooling cup for controlling the source temperature between +5 °C and room temperature (requires cooling water assembly, chiller or facility cooling lines)

Please note that this option does not include a precursor container.

Liquid source precursor containers LS-BL-PC/200 and LS-BL-PC/200 DOT

Additional liquid source containers.

Liquid source container
with boosting line
  • for water (H2O), trimethyl aluminum (TMA), diethyl zinc (DEZ), titanium tetrachloride (TiCl4) etc.
  • volume 200 ml, maximum filling volume 150 ml*
  • equipped with two separate lines with manual valves
  • material: stainless steel
  • LS-LS-BL-PC/200 : for H2O, TMA, DEZ, TiCl4 etc.
  • LS-BL-PC/200 DOT : for H2O, TMA, DEZ, TiCl4 etc., DOT* certified

*) Department of Transportation (USA)

Liquid source line with single output line LS-SL

For H2O, TMA, DEZ, TiCl4 etc.

Liquid source line
with single output line
LS-SL

Includes:

  • pneumatic pulsing valve
  • orifice for pulse adjustment (high precision needle valve available as an option) orbital welded stainless steel tubing with VCR ® (Swagelok) fittings
  • aluminum liquid source container holder cooling cup for controlling the source temperature between +5 °C and room temperature (requires cooling water assembly, chiller or facility cooling lines)

Please note that this option does not include a precursor container.

Liquid precursor source, single line design LS-SL

For high vapour pressure precursors (H2O, TMA, DEZ etc.)
Includes:

  • two pneumatic pulsing valves,
  • high precision orifice for dose adjustment,
  • stainless steel tubing with VCR connectors
  • cooling cup for liquid source container

Liquid source precursor container  LS-SL-PC/200, LS-SL-PC/200/H2O and LS-PC/200/DOT

  • additional containers
  • volume 200 ml, maximum filling volume 150 ml
  • three different container types for different chemicals
  • LS-PC/200/H2O for H2O and other non-toxic and corrosive chemicals
  • LS-PC/200 for H2O, TMA, DEZ, TiCl4 etc
  • LS-PC/200/DOT for H2O, TMA, DEZ, TiCl4 etc,  DOT* certified
  • using separate containers for different precursors prevents cross contamination
  • containers are equipped with output line with manual valve
  • convenient filling port for adding chemicals
  • material stainless steel

*) Department of Transportation (USA)

Liquid source pressure transducer  LS-PT

For monitoring liquid source pulsing.

Liquid source pressure
transducer LS-PT (arrow)

 

  • useful for preventing running out of precursors during runs
  • specifically useful for process development
  • compatible with both LS-SL and LS-BL source line configurations
  • Pressure range 0 – 100 Torr.

Needle valve for dose adjustment NV-HP

Replaces the orifice in the standard single-line liquid source.

Needle valve (arrow)
  • allows easy, high precision dose adjustment during process tuning
  • for new chemistry depositions
  • adjustable flow range

 

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Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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