Fast, faster, SALD

Industrial scalability for solar cell passivation with Spatial ALD

Beneq and Aalto University's Electron Physics Group studied how Spatial ALD (SALD) can provide surface passivation of planar and black silicon (b-Si), and the results were excellent! Spatial ALD not only provided as efficient surface passivation as temporal ALD, but it also performed faster - the passivation line speed was 9 m/min!

Why can Spatial ALD passivate faster than traditonal temporal ALD, you're wondering? Let's let our Process Specialist, Ismo T. S. Heikkinen, who held his poster presentation "Efficient surface passivation of back silicon using spatial atomic layer deposition" at the SiliconPV conference in Freiburg this year, explain.

"With the Beneq large-scale Spatial ALD pilot system, the substrate moves along a line under a percursor delivery system called the coating head. The coating head has 11 reconfigurable precursor zones, with the precursors themselves isolated by inert gas zones and exhaust lines. We can coat large area substrates faster along this conveyer belt-like system."

Illustration of the Spatial ALD reactant delivery system, where precursors are isolated from each other by inert gas zones and exhaust lines.

This is great news for industrial scalability - if you're in the microelectronics or photovoltaics industry, you'll definitely want to learn more about our spatial ALD pilots and the possibilities of customizing the Beneq spatial ALD reactors for your specific needs.

The microscopic photograph at the top shows a freshly etched b-Si surface. Photograph courtesy of Toni Pasanen, Aalto University.

Read more

Ismo's poster presentation Efficient surface passivation of back silicon using spatial atomic layer deposition

Beneq Science letter about Beneq and Aalto University's Department of Electronics and Nanoengineering research

More about Beneq spatial ALD equipment and test systems:

Fast large-area spatial ALD is here!

Results of large-area ALD tests with Beneq’s new spatial ALD equipment

Beneq Rotary Spatial ALD

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Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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