Products

Spatial ALD Equipment

Roll-to-roll or rotary ALD systems for flexible substrates in R&D and production. Custom-build based on your specific requirements.


Beneq WCS 600

Large-area, roll-to-roll ALD system for R&D and pilot production. With a unique design the precursor separation on the ALD head is achieved by maintaining both a differential pressure and an exhaust/purge/exhaust structure that allows a spacing for the substrate to pass through. The ALD head swings back and forth to achieve roll speeds up to 10 meters per minute on substrates such as polymers, metals and flexible glass.

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Beneq C2R

Wafer plasma batch processing is revolutionized through this rotary, spatial ALD tool. By doing away with pulsing and purging of precursors, the substrate rotates through various reactive and purging zones to achieve unparalleled throughput and simplicity.

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comparison

Which product is for you

Product WCS 600 P800
Dimensions 2060 x 2340 x 2150 mm 3200 x 1340 x 2460 mm
Web Width 625 mm continuous web feed 600 mm x 800 mm sample
Web Thickness 20 – 200 um 300 mm chamber height
Web Speed 0.05 – 10 m/min n/a
Temperature Range 25 – 150 C 50 – 500 C
Product WCS 600
Dimensions 2060 x 2340 x 2150 mm
Web Width 625 mm continuous web feed
Web Thickness 20 – 200 um
Web Speed 0.05 – 10 m/min
Temperature Range 25 – 150 C
WCS600
Product P800
Dimensions 3200 x 1340 x 2460 mm
Web Width 600 mm x 800 mm sample
Web Thickness 300 mm chamber height
Web Speed n/a
Temperature Range 50 – 500 C
P800

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