The simple and elegant ALD solution for compound semiconductor device fabrication.
Beneq Prodigy™ is the ideal manufacturing solution for VCSEL, LED and MEMS manufacturers and foundries looking to enhance the device performance and reliability through an affordable stand-alone ALD batch tool. Beneq Prodigy provides best-of-breed passivation and/or encapsulation films across multiple wafer types and sizes.
High end technology for a lower price. Prodigy offers a unique breakthrough in economy, capacity and reliability to the compound semiconductor and MEMS manufacturing market.
More time to think about solutions. Prodigy offers pure simplicity through automated loading with horizontal wafer handling and straight-forward maintenance and serviceability with easy side access.
Defining new standards. This tool sets a completely new standard for affordable, high-volume manufacturing of compound semiconductors and MEMS devices with ALD. We use simple automation and reliable reactor design gained at Beneq over 15 years to deliver proven results for high-end application areas.
Beneq Prodigy is cleanroom compatible with SECS/GEM communication capabilities and is compliant with the highest SEMI S2 standards.
| Product | Transform®  | Transform ® 300  | Prodigy  |
|---|---|---|---|
| Dimensions | 3000 x 3000 x 2250 mm | 4400 x 4800 x 2250 mm | 3500 x 2500 mm |
| Max Batch Load | 200 mm x 25 wafers | 300 mm x 25 wafers | 150 mm x 50 wafers, 100 mm x 75 wafers |
| VCE Loadlocks | 2 | EFEM | 1 |
| Integration | Cluster, up to 3 ALD modules & 1 pre-heater | SECS/GEM | Standalone system |
| Ozone Process Capability | Optional | Optional | Optional |
| Wafer Pre-Heating | Yes | Yes | Yes |
| Wafer Cooling | Built-in | Built-in | No |
| Temperature Range | 25 – 420 ℃ | 25 – 420 ℃ | 25 – 420 ℃ |
| Plasma Gas Lines | 2 + 2 optional | 3+1 optional | 0 |
| Transfer Module Type | Mx600 | M2C5 | Automatic Loader |
| Wafer Throughput (Al2O3 @ 200 C, 50 nm) | 40 wafers/hour – 3 PM | 12 wafers/hour – 1 PM | >14 wafers/hour |
| Wafer Throughput (HfO2 @ 250 C, 20 nm) | 28 wafers/hour – 3 PM | N/A | N/A |
| Integration | SECS/GEM | SECS/GEM | SECS/GEM |
| Safety and Ergonomics | SEMI S2 and S8 | SEMI S2 and S8 | SEMI S2 |
Learn more about Beneq’s Development Service. Visit our FAQ page for expert guidance.
Learn moreIf you are an existing customer seeking support, upgrades or spare parts, please use our Support form.
