From pilot to volume production – qualified for advanced surface engineering

Beneq Transform® is an ALD cluster tool designed for technology development and manufacturing across power electronics (SiC, GaN, Si), RF, optoelectronics, microLED, MEMS, and sensors. Built for volume production, Beneq Transform scales with throughput and application requirements. It is an ideal platform for applications requiring surface engineering such as surface passivation of wide-band gap materials.

Versatile platform

Thermal and plasma enhanced ALD (PEALD) in a single tool

  • Combine thermal batch and single-wafer PEALD without breaking vacuum
  • Up to three process modules plus preheating in the same cluster
  • Flexible source configuration for a broad range of oxides, nitrides and nanolaminates
  • Same hardware architecture from R&D to production

Fab-ready by design

Built for throughput, uptime, and seamless fab integration

  • Cycle times down to single-digit seconds for 25-wafer mini-batch processing
  • Preheating module cuts cycle time and enhances productivity
  • Reliable wafer automation with integrated cooling
  • Certified to SEMI S2/S8 and compliant with NFPA 79, Machinery Directive, and UL standards

Application examples

  • Surface passivation of GaN HEMTs
  • Gate oxide for SiC MOSFETs, GaN MISFETs, and vertical GaN devices
  • Surface passivation and etch hardmask for MEMS devices, including RF filters
  • Final passivation of RF and power devices
  • Surface passivation of MicroLEDs and photonics devices
  • Isolation, barrier, and seed layers for TSVs

From the Lab to Pilot Production

Introducing Beneq Transform® Lite

Whether supporting low-volume manufacturing or conducting technology development, the Beneq Transform® Lite delivers. It offers the versatility and capabilities of the full Transform platform – at a lower CAPEX investment.

 

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