Semiconductor Equipment Parts

ALD coatings give better performance and longer life to semiconductor equipment parts—covering etch, deposition, source delivery, components, and DUV lithography.

Why ALD. The 3D shift in logic and memory is demanding more from part coating. As nodes shrink and defect sensitivity rises, ALD coatings like Y2O3 provide high conformality, effectively zero porosity, corrosion & resistance—reducing defects & particles, contamination, process drift, and downtime and can increase part lifetime.

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Use ALD when requirements exceed what conventional coatings can deliver. ALD is the right choice for complex 3D parts, for applications that demand uniform and pinhole-free coverage, and wherever reliability, purity, or controlled film growth are critical. Use ALD when:

  • Complex geometries require complete, conformal coverage.
  • Precise, high-quality films are needed to meet demanding specifications.
  • No other coating method can close the performance gap.

Pair ALD with methods such as anodization or plasma spray when additional thickness, mechanical strength, or coating functionality is needed beyond what ALD provides on its own.

  • The application benefits from ALD’s precision combined with bulk thickness or mechanical robustness.
  • A hybrid stack enables better durability, corrosion resistance, or surface performance than a single coating alone.
  • The goal is to enhance an existing coating rather than replace it.

Etch

Example Parts:

  • Window
  • Injector
  • Liner
  • Pedestal
  • Gas/Exhaust plates

ALD Delivers:

  • Corrosion Resistance
  • Part Lifetime Increase
  • Particle Control
  • Maintenance Frequency Reduction
  • Process Drift Prevention

 

Deposition

Example Parts:

  • Showerhead
  • Liner
  • Pedestal
  • E-chuck

ALD Delivers:

  • Corrosion Resistance
  • Part Lifetime Increase
  • Particle Control
  • Maintenance Frequency Reduction
  • Process Drift Prevention

Source Delivery

Example Parts:

  • Gas line
  • Source canister
  • Filters

ALD delivers:

  • Corrosion Resistance
  • Part Lifetime Increase
  • Particle Control
  • Impurities Reduction

Components

Example Parts:

  • Valves
  • MFC
  • Remote plasma source
  • O3 generator

ALD Delivers:

  • Corrosion Resistance
  • Part Lifetime Increase
  • Impurities Reduction

Materials

OXIDES AND NITRIDES Y2O3 YAG SiO2 Al2O3 MgO AlN
Process temperature ≤300 °C ≤300 °C ≤300 °C ≤300 °C ≤300 °C ≤380 °C
Density (g/cm3) [bulk] 4.95 3.3-4.9 2.0 3.27 - -
Composition 2:3 Tailorable 1:2 2:3 1:1 1:1
Morphology Cubic Amorphous Amorphous Amorphous - -
Porosity Near-zero Near-zero Near-zero Near-zero Near-zero Near-zero

FLUORIDES AlF3 ErF3 MgF2 YOF YF3
Process temperature ≤300 °C ≤300 °C ≤300 °C ≤300 °C ≤300 °C
Density (g/cm3) [bulk] 3.3 - 3.1 - -
Composition ~1:3 ~1:3 1:2 Tailorable 1:3
Morphology Amorphous Orthorhombic Tetragonal Amorphous Orthorhombic
Porosity Near-zero Near-zero Near-zero Near-zero Near-zero

“ALD coatings really have made a difference in high-aspect-ratio parts like gas lines, source canisters, and showerheads. We have helped customers to achieve fewer defects in advanced nodes after they struggled with alternative solutions.” – Lassi Leppilahti, Process Team Manager

Tooling Essentials The right coating method calls for the right tool. Beneq’s P800—the industry’s benchmark ALD platform for part coating—has the right formula for maximizing ROI:

Maximum Capacity: Large reactor volume and volume utilization

Versatility: Maximize SAM with broad process availability and part compatibility

Reliability: Production-proven ALD part coating system

Low Takt: Overheads managed and deposition time optimized

Beneq’s ALD Part Coating Leadership is powered by the Beneq P800

The Beneq P800 is specifically designed to coat big parts of complex shapes or large batches of smaller parts.

P800

P800

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