Products

Research equipment

Beneq is the most installed ALD equipment provider for academic research and corporate R&D. Our products have been designed to minimize cross contamination in a multi-user research environment. Wide range of options and upgrades for the most demanding research requirements.

R2 landscape

Beneq R2

Compact. Scalable. Perfect for starting your research journey with ALD. It is expandable with optional modules raging from 3D chamber, plasma ALD and particle coating capabilities. Available at EUR 130,000.

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Beneq TFS 200

ALD tool with a dual chamber structure and all metal sealing surfaces for minimal cross contamination. The TFS 200 straddles research and production with vast array of options and automation. Inert gas valving prevents precursor residues from entering the reaction chamber ensuring short ALD cycles.

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Beneq TFS 500

Featuring all the capabilities of the TFS 200, the TFS 500 has the same capabilities on a grander scale. The larger reaction chamber makes it capable to process 300 mm wafers, solar cells and powders. Front access allows for easy loading and unloading of medium to large 3D objects.

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Comparison

Which product is for you

Product R2 TFS 200 TFS 500
Dimensions 720 x 1340 x 1280 mm 720 x 1340 x 1280 mm 1600 x 900 x 1930 mm
Chamber volume 200 x 3 mm (diameter x height) 200 x 95 mm (diameter x height) 200 x 170 mm (diameter x height)
Usage Research Research, Production Research, Production
Integration Stand Alone Cluster Cluster
Temperature Range 25-400 °C 25-500 °C 25 – 500 °C
Very Low Vapor Pressure Precursors No Yes Yes
Product R2
Dimensions 720 x 1340 x 1280 mm
Chamber volume 200 x 3 mm (diameter x height)
Usage Research
Integration Stand Alone
Temperature Range 25-400 °C
Very Low Vapor Pressure Precursors No
R2
Product TFS 200
Dimensions 720 x 1340 x 1280 mm
Chamber volume 200 x 95 mm (diameter x height)
Usage Research, Production
Integration Cluster
Temperature Range 25-500 °C
Very Low Vapor Pressure Precursors Yes
TFS 200
Product TFS 500
Dimensions 1600 x 900 x 1930 mm
Chamber volume 200 x 170 mm (diameter x height)
Usage Research, Production
Integration Cluster
Temperature Range 25 – 500 °C
Very Low Vapor Pressure Precursors Yes
TFS 500

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