Research

Beneq is the most installed ALD equipment provider for academic research and corporate R&D. Our products have been designed to minimize cross contamination in a multi-user research environment. Wide range of options and upgrades for the most demanding research requirements.

TFS 200

TFS 200

With over 160 units installed, Beneq TFS 200 is the most recognized ALD platform used by academic researchers and corporate R&D teams worldwide.

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TFS 500

TFS 500

The ultimate thin film system for ALD research and batch production.

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Product TFS 200 TFS 500
Dimensions (L x W x H) 1325 mm x 600 mm x 1298 mm 1800 mm x 900 mm x 2033 mm
Chamber volume 200 x 95 mm (diameter x height) 200 x 170 mm (diameter x height)
Usage Research, Production Research, Production
Integration Load lock, cassette loader, cluster or glove box Load lock, cassette loader, cluster or glove box
Temperature Range 25-500 °C 25 – 500 °C
Very Low Vapor Pressure Precursors Yes Yes
ALD modes Thermal ALD, Reduced flow HAR, Fluid bed, Remote plasma ALD, Direct plasma ALD Thermal ALD, Remote plasma ALD, Direct plasma ALD
Cleanroom collaboration stock

Looking to adopt ALD in your product design and production?

Learn more about Beneq’s Development Service. Visit our FAQ page for expert guidance.

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