Batch Production
Largest scale, general purpose ALD production systems ideal for coating diverse substrate types and thick films. Easily scale up ALD deposition from the R&D phase to full manufacturing.
| Product | P1500 | P800 | P400A |
|---|---|---|---|
| Process temperature range | 25 – 400 °C | 25 – 550 °C | 25 – 550 °C |
| Vacuum chamber dimensions | W: 1700 mm | ø800 mm | ø400 mm |
| Reaction chamber types and dimensions | Application specific, substrate space, e.g.: 1300 × 2400 × 750 mm | Application specific, substrate space, e.g.,: – 550 × 310 × 700 mm – 380 × 380 x 900 mm, – 730 x 1200 x 10 mm | Application specific, substrate space, e.g.: – 240 × 240 × 720 mm, with 23 shelf cassette – 370 × 470 x 25 mm, with 2 shelf cassette |
| Precursor sources | 4 liquid sources, 2 heated sources, and 2 gas sources with max source capacity of 16.2 L | 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible. | 5 parallel feeding lines for gas, liquid and solid precursors. Up to 10 precursors possible. |
| Control system | PLC control with PC user interface | PLC control with PC user interface | PLC control with PC user interface |
| Main dimensions (L × W × H) | 6195 × 2480 × 2600 (mm) | 3200 × 1340 × 2460 (mm) | 2400 × 930 × 2420 (mm) |