Spare Parts and Upgrades

All Beneq products have been designed with flexibility and usability in mind. With the right options and upgrades you will always have the optimal equipment setup that will grow with you. The right configuration will also help you to decrease your valuable production downtime, maintenance, and repair costs. Below you will find more information about the many options and upgrades available.

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Ellipsometer

Ellipsometer Arrow icon

Monitor ultra-thin films in nm scale.
Fluidized bed reactor (FBR)

Fluidized bed reactor (FBR) Arrow icon

For truly conformal coating of fine powders.
High Aspect Ratio (HAR) reaction chamber

High Aspect Ratio (HAR) reaction chamber Arrow icon

For demanding high aspect ratio substrates.
Hot source HS 300

Hot source HS 300 Arrow icon

For depositing precursors with low vapor pressure.
Hot source HS 500

Hot source HS 500 Arrow icon

For using precursors with very low vapor pressure.
Liquid source

Liquid source Arrow icon

Flexibility through easy use of multiple chemistries.
Ozone gas options

Ozone gas options Arrow icon

For use of ozone gas in thermal ALD depositions.
Plasma-enhanced ALD (PEALD)

Plasma-enhanced ALD (PEALD) Arrow icon

For TiN, SiO2, Al2O3 and SiN processes and high-speed processing.
Quartz Crystal Microbalance (QCM)

Quartz Crystal Microbalance (QCM) Arrow icon

For in-situ thin film growth monitoring.
Quadruple Mass Spectrometer (QMS)

Quadruple Mass Spectrometer (QMS) Arrow icon

For process development, DBR process monitoring and system leak checking.
Reaction chambers

Reaction chambers Arrow icon

Cross-flow precursor delivery for excellent thin film uniformity.
Thermal gas line

Thermal gas line Arrow icon

For controlled gaseous precursors pulsing.

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