ALD Precursor Design for Hard to Deposit Metals with Chuck Winter
ALD Stories Ep. 6
ALD Stories Ep. 6
Tyler sits down with Wayne State University’s Chuck Winter to talk about his approach to designing precursors for ALD. Chuck explains what makes a good ALD precursor and how elegant organic chemistry can enable ALD processes for hard-to-deposit metals, like cobalt and aluminum. Learn more about Chuck’s research here: http://www.clas.wayne.edu/wintergroup/
Papers mentioned in this episode:
https://doi.org/10.1021/acs.chemmater.7b02456 – Co metal ALD
https://doi.org/10.1021/acs.chemmater.8b00445 – Al metal ALD
Today there are over 60,000 patents worldwide involving Atomic Layer Deposition. However, despite the vast amount of research and development there are only a handful of public conferences where we can meet our fellow researchers and hear more about the work they have done. In this series we will speak to engineers, scientists as well as those working on commercializing the technology in notable new applications. You will hear their personal stories and experiences with ALD.
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