Beneq C2R®

The Era of Spatial ALD is Here

Beneq C2R™ delivers low-temperature, plasma-enhanced spatial ALD with growth rates of up to 2000 nm/h. Optical designers can access unmatched tunable refractive index and zero-stress properties 
— for AR/VR waveguides, bandpass filters, and more. Unlock dense, uniform films at breakthrough deposition rates with Beneq C2R™ .

Watch the film

Introducing the world’s fastest commercial ALD system.

The C2R™ delivers coating speeds of up to 2000 nm/h or 0.55 nm/s, offering a 20x increase over conventional ALD deposition rates. This remarkable speed is achieved through its spatial ALD design, with a maximum rotation speed of 200 rpm and an ALD cycle time of just 300 ms. The substrate-to-precursor exposure time is approximately 30 ms, ensuring rapid, efficient deposition.

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Up to

0.55 nm

per second

2000 nm

per hour

SiO2 Deposition Rate Comparison (nm/h)

C2R 2000 nm/h
Conventional ALD 100 nm/h
Rotary Spatial ALD

Continuous Processing

Our rotary design of spatial ALD eliminates time-consuming pulsing and purging. By separating precursors in space rather than time, the process enables continuous flow, with higher deposition rates driven by chemical kinetics and substrate movement through precursor zones.

C2R Performance Chart Rotating Overlay C2R Performance Chart
Precursor Zone
Plasma Zone

Enhanced Precision with Broadband Monitoring (BBM)

Our BBM option elevates ALD precision by continuously measuring the sample’s transmission spectrum during each rotation. The process automatically halts when the measured spectrum matches the simulated one, ensuring:

 

Exceptional coating thickness accuracy, crucial for multistack coatings, for example

Continuous deposition rate monitoring for diagnostics and fine-tuning

ReCalc-ReOpt™ technology for real-time reoptimization and compensation 1

1 ReCalc-ReOpt™ is trademark of Laser Zentrum Hannover e.V. (LZH)

High-Index Conformal Coatings for AR/VR Waveguides

Modern AR/VR waveguides demand low optical loss, low-temperature processes, and polymer compatibility. Our TiO₂ ALD at 100°C delivers high refractive index (~2.61 at 448 nm) with minimal optical loss (~3 dB/cm), offering conformal coatings and gap filling on optical gratings, all at polymer-safe temperatures.

 

Unmatched Stress Control for IR Longpass Filters.

C2R™ enables precise stress control in thicker, multi-layer ALD coatings, where stress management becomes critical. Our expertise allows tuning stress from 1000 MPa to –200 MPa. For filters ranging from UV-Vis to Far infra-red, SiO₂ and Ta₂O₅ coatings can achieve zero stress and optimal optical performance.

 

 

C2R™ tech sheet

High film thickness uniformity, suitable for demanding optical coating applications. Can be equipped with a load lock or wafer automation.

Process type
Plasma Enhanced Spatial ALD
Plasma Power
Max power 1000W
Batch capacity
7 pcs of 200 mm wafers/glass lenses
Wafer/glass lens thickness, max
12mm standard, up to 30mm upon request
Readily available processes
Al₂O₃, SiO₂, Ta₂O₅, TiO₂, HfO₂
Multilayer stack
Other processes available upon request
Deposition rate
Up to 2000 nm/h (process dependent)
Process temperature range
25 - 200°C
Max wafer holder rotation speed
200 rpm
Wafer automation
Brooks MX400 with optional preheater and aligner
Precursor cabinet
4 sources, individually heated up to 120°C
+ 3 inlet for plasma gases
In situ process monitoring
Broadband monitoring, 400 nm - 1700 nm using witness sample
Example Substrates
Polymer optics e.g. for automotive camera lenses, High curvature lenses, 200 mm wafers
Cleanroom collaboration stock

Looking to adopt ALD in your product design and production?

Learn more about Beneq’s Development Service. Visit our FAQ page for expert guidance.

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