Beneq C2R™ delivers low-temperature, plasma-enhanced spatial ALD with growth rates of up to 2000 nm/h. Optical designers can access unmatched tunable refractive index and zero-stress properties — for AR/VR waveguides, bandpass filters, and more. Unlock dense, uniform films at breakthrough deposition rates with Beneq C2R™ .
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The C2R™ delivers coating speeds of up to 2000 nm/h or 0.55 nm/s, offering a 20x increase over conventional ALD deposition rates. This remarkable speed is achieved through its spatial ALD design, with a maximum rotation speed of 200 rpm and an ALD cycle time of just 300 ms. The substrate-to-precursor exposure time is approximately 30 ms, ensuring rapid, efficient deposition.
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Our rotary design of spatial ALD eliminates time-consuming pulsing and purging. By separating precursors in space rather than time, the process enables continuous flow, with higher deposition rates driven by chemical kinetics and substrate movement through precursor zones.
Our BBM option elevates ALD precision by continuously measuring the sample’s transmission spectrum during each rotation. The process automatically halts when the measured spectrum matches the simulated one, ensuring:
1 ReCalc-ReOpt™ is trademark of Laser Zentrum Hannover e.V. (LZH)
Modern AR/VR waveguides demand low optical loss, low-temperature processes, and polymer compatibility. Our TiO₂ ALD at 100°C delivers high refractive index (~2.61 at 448 nm) with minimal optical loss (~3 dB/cm), offering conformal coatings and gap filling on optical gratings, all at polymer-safe temperatures.
C2R™ enables precise stress control in thicker, multi-layer ALD coatings, where stress management becomes critical. Our expertise allows tuning stress from 1000 MPa to –200 MPa. For filters ranging from UV-Vis to Far infra-red, SiO₂ and Ta₂O₅ coatings can achieve zero stress and optimal optical performance.
High film thickness uniformity, suitable for demanding optical coating applications. Can be equipped with a load lock or wafer automation.
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