Beneq C2

Automated batch wafer ALD equipment for high volume manufacturing

Beneq C2™ is the automated wafer solution in Beneq’s Cluster-compatible equipment portfolio. It offers a unique combination of high capacity batch processing and standard cassette-to-cassette automation..

Beneq C2 wins Compound Semiconductor High Volume Manufacturing Award

Beneq C2 is perfectly suited for high volume manufacturing in various wafer-based applications, including MEMS, LED, OLED, ink-jet print heads and more. The thermal batch ALD process of Beneq C2 is ideal for oxide and nitride processes used for dielectric, conductor, barrier and passivation purposes.

Beneq C2 equipment is available both as a single-wafer version and as batch-processing equipment.

Process details:

  • Up to 200 mm wafers in diameter
  • 20 000 wafers per month (10 nm of Al2O3 ALD coating on 200 mm wafers).
  • Face-down and face-up processing options.

If you are looking for more information on Beneq C2 and some technical details, please contact our Thin Film Solutions team.

Read more about the CS High-Volume Manufacturing Award 2018 by Compound Semiconductor

 

Process type
  • thermal ALD
  • single wafer PEALD
Usage
  • production
Substrate type
  • up to 200 mm wafer
  • up to 25 wafers / batch
Substrate loading
  • automatic
Main dimensions
  • 1650 x 700 x 2260 mm (without automation)
Integration
  • cluster

 

Substrate temperature range  25 - 430 °C
Batch size
  • Thermal ALD for 1 - 25 wafers, up to 200 mm
  • PEALD for single wafers, up to 200 mm
Gas lines  Up to 2
Liquid sources
(+5 °C to ambient)
 Up to 3
Hot sources
(ambient to 220 °C)
 Up to 2
Throughput  15 wafers / h (50 nm AI2O3)
Plasma option (PEALD)  Type: Capacitively Coupled Plasma (CCP)
Control system  PLC control with PC user interface
Main dimensions, ALD system
(L x W x H)
 1650 x 700 x 2260 (mm)
Main dimensions, electric cabinet (L x W x H)  1000 x 300 x 1600 (mm)

 

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Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq aerosol thin film equipment is ideal for AR coatings on solar glass.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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