Beneq TFS 200 Options

ALD research equipment that grows with you

Beneq TFS 200 ALD equipment is a research platform that can be expanded to fit your research needs. The available options and upgrades support the versatility and modularity of the Beneq TFS 200 equipment and improve the efficiency of the ALD process.

The easiest way to get an offer for Beneq TFS 200 options is to fill in the Beneq TFS 200 option quote form.

Read more about some of our available upgrades and options.

FLUIDIZED BED REACTOR

HIGH ASPECT RATIO

LIQUID SOURCE 

HOT SOURCE HS300

HOT SOURCE HS500

THERMAL GAS LINE

OZONE GAS

REACTOR CHAMBER

SUBSTRATE LOADER & LOAD LOCK

PLASMA ENHANCED ALD

ELLIPSOMETER

QCM

Contact our sales team to hear more about all available options and upgrades for your TFS 200 ALD equipment. 

Fluidized Bed Reactor

Fluidized Bed Reactor (FBR) is a versatile particle coating option for Beneq TFS 200. The FBR particle coating chamber is easily mounted onto the Beneq TFS 200 vacuum chamber. The FBR coating option allows truly conformal coating of fine powders. A chamber-in-chamber design provides highest process versatility and coating quality. The convenient size of the removable coating chamber simplifies loading and unloading of the powders.

High Aspect Ratio solutions

Beneq has a series of reaction chambers specifically designed for coating of demanding High Aspect Ratio (HAR) substrates. From surfaces with curves and holes to the most demanding HAR imaginable, you can control the precursor dwelling time without limits, allowing permeation to the most difficult corners of the most challenging cavities. Beneq TFS 200 enables coating inside nanotubes, filters, ceramics and pores. It will take your ALD to a whole new level, creating great opportunities for material science and surface properties customization.

Liquid source options

Beneq’s liquid source options support the versatility and modularity of the Beneq TFS 200 research platform. More liquid sources enable more processes running simultaneously.

Liquid source line with boosting functionality LS-BL

Improves control over line purging in the non-heated precursor sources. Excellent for higher vapor pressure liquid precursors. 

Liquid source precursor container LS-BL-PC/200

Increase precursor yield, avoid constant refilling of precursors and reduce down time with this container.

Liquid source line with single output line LS-SL

Improves line and process purity and delivers excellent dose with line purging control. Compatible with higher vapor pressure precursors.

Liquid source precursor container LS-SL-PC/200

Increase precursor yield, avoid constant refilling of precursors and reduce down time with the dedicated container for specific precursors.

Liquid source pressure transducer  LS-PT

Prevent running out of precursors during ALD runs with this transducer.

Needle valve for dose adjustment NV-HP

Enables high precision dose adjustment during process tuning and saves chemical precursor quantities.

Hot Source HS300 options

Beneq’s hot source options enable the use of low vapor pressure precursors and open the possibility to integrate more processes to your TFS 200. Compatible with liquid and solid precursors, enables inert precursor depositions, and safe storing and transportation of precursors.

Hot source HS 300

Exceptionally accurate temperature control during ALD runs for precursors that require inert handling.

Dual hot source DHS 300

Similar to HS 300, but enables handling of two hot source precursors. 

Hot source precursor container HS 300-PC

For precursors that need heating for adequate chemical dosing. Increases precursor yield and doses.

Particle filter for HS 300

Particle filtration unit for light and very fine powder precursors.

Hot Source HS 500 options

Beneq’s hot source options enable the use of low vapor pressure precursors and open the possibility to integrate more processes to your TFS 200. HS 500 enables the direct transfer of precursors from container to reaction chamber, allowing fast and efficient use of challenging precursors. Excellent for research purposes enabling chemistry research of new precursors with small quantities. 

Hot source HS 500

Exceptionally accurate temperature control during ALD runs.

Precursor crucible for HS 500

Container for precursor chemical.

Thermal gas line options

Thermal gas lines enable integration of gaseous precursors to the ALD equipment with high control. Gas lines are used for pulsing thermal ALD and gaseous precursors into the reaction chamber. Three safety levels available for matching the gas line specifications with local and facility safety rules and requirements. 

Gas line TGL-1, TGL-2 and TGL-3

Ozone gas options

Beneq ozone line and generator options allow ozone gas to be used in thermal ALD depositions. The ozone line option incorporates a gas cabinet that includes an ozone generator, flow adjustment devices, ozone reservoir and destructor. 

Ozone line option

Full cabinet assembly for generating ozone gas for ALD deposition

Ozone analyzer

Analyzer for measuring ozone concentration, enabling higher control of your process parameters.

Reaction chamber options

Beneq offers several reactor chamber options for various samples and sample sizes. All chamber options support highly controlled ALD, excellent thin film uniformity and precise precursor dosing. Chambers are interchangeable, they are easy to assemble and quick to install. This unique feature enables multi-user, multi-process use of TFS 200, making it a sound investment which can be used without fear of any cross contamination.

Substrate loader and load lock options

An integrated load lock allows for maximal purity in the process and minimal heat loss from the reaction chamber. Load locks minimize the heat loss from the reaction chamber while substrates are being loaded and unloaded. A load lock is required for certain chemistries in which a very high level of purity is needed.

Plasma Enhanced ALD Options

The Plasma Enhanced ALD (PEALD) options enable new processes, for example processes which usually require low temperature deposition and/or high-speed processing. This upgrade will allow you to run PEALD and ALD in one tool, with ease of use, enhancing the versatility of your TFS 200.

Plasma option PO-200

PEALD is immensely useful to achieve depositions on temperature sensitive substrates such as polymers. This full option includes plasma head PH-200, plasma matching box, plasma generator, plasma carrier gas line with mass flow controller (MFC) and plasma generator rack. 

Plasma reaction chamber PRC-200

Low volume reaction chamber design enables fast purging and high deposition rates. 

Ellipsometer

The ellipsometer offers the best possible results for monitoring ultra-thin films for advanced ALD applications in sub-nanometer scale. The in-situ ellipsometry is integrated into the Beneq ALD reactor, providing a completely new dimension for studying ALD film growth.


Excellent thickness linearity measured with Film-Sense FS-1 ellipsometer
integrated into Beneq TFS 200 ALD reactor.

QCM

Quartz Chrystal Microbalance (QCM) can be used for in-situ film growth monitoring during ALD deposition. It is an excellent way to expand Beneq’s ALD system capabilities for new chemistry development. The sensor can be equipped with different crystals for a wide range of temperatures. The QCM option can be easily upgraded to any thermal ALD reactor.

Contact Beneq

Contact Beneq

Application examples

  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq aerosol thin film equipment is ideal for AR coatings on solar glass.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

Proceed to download