Beneq strengthens its lead in high-volume industrial ALD

Beneq, a leading supplier of ALD equipment and thin film coating services, today announced two new thin film equipment solutions for industrial customers that require high capacity and low process cost in advanced ALD applications. The new products are set to revolutionize the standards of coating speed in the ALD industry.


Beneq R11™ – Ultra-fast high precision spatial ALD coating

Beneq R11 is the latest addition to Beneq’s extensive portfolio of large-throughput spatial ALD solutions for industrial use. It provides an optimal solution for high performance ALD on wafers in industrial applications, such as optical coatings, insulators and barriers. It is the ideal choice of equipment when speed, cost, low process temperature and the highest possible film quality are the driving factors.

With Beneq R11, it is for the first time possible to use PEALD (Plasma Enhanced ALD) processes in high volume manufacturing. The system lends itself to barrier, insulation and anti-corrosion applications for MEMS, LED, OLED, photovoltaics, high power semiconductors, sensors and many other components.

The equipment is suitable for up to 200 mm wafers and other round or rectangular substrates. The plasma enhanced rotary ALD process of Beneq R11 is ideal for thick ALD films, in the micrometer thickness range. Beneq R11 can also be equipped with standard wafer automation.




Beneq T2S™ – Automated batch wafer equipment

Beneq T2S is the newest member of Beneq’s wafer-based production equipment portfolio. It offers a unique combination of high capacity batch processing and standard cassette-to-cassette automation. The Beneq T2S is specifically engineered to match the semiconductor requirements, including the SEMI S2 safety requirements and low particle counts.

Beneq T2S is perfectly suited for high volume manufacturing in various wafer-based applications, including MEMS, LED, OLED, ink-jet print heads and more. The thermal batch ALD process of Beneq T2S is ideal for oxide and nitride processes used for dielectric, conductor, barrier and passivation purposes.

The equipment is designed for wafers up to 200mm in diameter and can process 25 wafers per run in face-down or face-up orientation.

New products officially unveiled in ALD2016 in Dublin, Ireland

Both new products, Beneq R11 and Beneq T2S, will be introduced officially for the first time next week at ALD2016 – the 16th International Conference on Atomic Layer Deposition, which will be held at the Convention Centre Dublin, Ireland, 24-27, July 2016. Beneq is a platinum sponsor of the event.

Says Tommi Vainio, Vice President, Thin Film Equipment, at Beneq: “High capacity industrial ALD solutions are an important and expanding part of our product portfolio. Our commitment to revolutionize the coating speed standards in the ALD industry is clearly demonstrated in the new ALD equipment we are launching in Dublin. From now on with Beneq, the unit for ALD area is m2 instead of mm2.” 

More information about the new products and the multitude of Beneq ALD applications is available at the Beneq stand in the ALD exhibition of the conference. The number of the Beneq booth is 30. You can also visit Beneq Monday through Wednesday at the Beneq Boat Bar right next to the convention centre.


Beneq®is a leading supplier of ALD equipment and thin film coating services, and world's premier manufacturer of ALD-based thin film electroluminescent displays.

Beneq thin film solutions improve the performance and durability of electronics, optics and sensitive materials, and protect from humidity, corrosion and tarnishing.

Beneq’s rugged, transparent and customized Lumineq® displays are used in a wide array of applications in extreme conditions. Fully transparent Lumineq TASEL® displays combine superior reliability with a unique see-through viewing experience.


Further information:

Matias Impivaara, Head of Marketing and Communications, +358 9 7599 530.

Beneq R11

Beneq T2S

Contact Lumineq

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Application examples

  • Chip-level ALD moisture barrier for components on tape
  • ALD anti-corrosion coating for semiconductor equipment parts
  • ALD gate dielectric for GaN power devices
  • ALD gate insulator for displays
  • Ultimate moisture barriers for OLED micro-displays from Beneq
  • Lumineq EL40S electroluminescent display by Beneq
  • Transparent electrode for displays by Beneq ALD
  • ALD is the ultimate moisture barrier for PCBs
  • Beneq FBR ALD reactor for moisture barriers of phospor powder
  • Beneq ALD coatings offer protection against corrosion in LED packaging.
  • Beneq ALD provides metal-like coatings for watch parts and fine mechanics.
  • Beneq ALD coatings for wafer-level moisture protection
  • Beneq ALD coatings provide high-quality reflectors for LED
  • Beneq ALD coatings boost the performance of diffractive gratings
  • Beneq provides ALD coatings to protect electronics components from corrosion
  • ALD coatings provide interface layers between materials in CIGS panels.
  • Beneq ALD coatings increase the lifetime of Li-Ion batteries
  • ALD is ideal for optical filters on complex surfaces.
  • Beneq ALD optical coatings increase the lifetime of high power lasers
  • ALD-based conformal moisture barrier coatings for microchannel plates from Beneq.
  • OLED lighting encapsulation with Beneq TFS 600. Fully automated and vacuum-line integrated. For industrial OLED encapsulation.
  • X-ray imaging scintillator plate encapsulation with Beneq Coating Services and Beneq P800 batch coating products

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