Thin Film Electroluminescent (TFEL) Displays are operated with 200V voltage and the thin film insulator layer needs to be fully pin-hole free to avoid breakdown. Sputtering was used in production but had problems with pin-holes.
An ALD nanolaminate film composed of alternating Al2O3 and TiO2 layers (ATO) was developed and taken into production and became the only viable option for this application.
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