Wafer Fab Equipment

Beneq Transform™

Versatile, automated ALD solution for high-throughput production.

Equipment

Transform™ Transform™ Lite
Maximum configuration 3 ALD modules & 1 pre-heater 2 ALD modules & 1 pre-heater
Preheating capability Yes Yes
Transfer module Brooks Mx600SS Brooks Mx400
Cooling option Built-in Facet-mounted
VCE loadlocks 2 1
Substrate Size 3", 4", 6" or 8" 3", 4", 6" or 8"
Substrate Si, GaN-on-Si, GaAs, InP, SiC, GaN, LNO, Sapphire Si, GaN-on-Si, GaAs, InP, SiC, GaN, LNO, Sapphire
Maximum configuration dimensions 3000 x 3000 x 2250 mm 3000 x 1250 x 2250 mm
Integration SECS/ GEM SECS/ GEM
Transform™
Maximum configuration 3 ALD modules & 1 pre-heater
Preheating capability Yes
Transfer module Brooks Mx600SS
Cooling option Built-in
VCE loadlocks 2
Substrate Size 3", 4", 6" or 8"
Substrate Si, GaN-on-Si, GaAs, InP, SiC, GaN, LNO, Sapphire
Maximum configuration dimensions 3000 x 3000 x 2250 mm
Integration SECS/ GEM
Transform™ Lite
Maximum configuration 2 ALD modules & 1 pre-heater
Preheating capability Yes
Transfer module Brooks Mx400
Cooling option Facet-mounted
VCE loadlocks 1
Substrate Size 3", 4", 6" or 8"
Substrate Si, GaN-on-Si, GaAs, InP, SiC, GaN, LNO, Sapphire
Maximum configuration dimensions 3000 x 1250 x 2250 mm
Integration SECS/ GEM

Throughput

Transform™ Transform™ Lite
Al2O3–200°C–50nm 40 wafers/ hour 15 wafers/ hour
HfO2–250°C–20nm 28 wafers/ hour 13 wafers/ hour
Transform™
Al2O3–200°C–50nm 40 wafers/ hour
HfO2–250°C–20nm 28 wafers/ hour
Transform™ Lite
Al2O3–200°C–50nm 15 wafers/ hour
HfO2–250°C–20nm 13 wafers/ hour

ALD Batch Process Module

Batch size
1, 10 or 25 wafers, up to 8"
Safety standards
SEMI S2 and S8
ALD processes
Al2O3, HfO2, Ta2O5, TiO2, SiO2, AlN, TiN (Others and metals to be released)
Processing temperature
Up to 420 °C
Liquid source lines
4
Ammonia (NH3) gas line
Yes
Ozone gas line
Optional
Process control
Recipe-based; fully configurable

ALD Plasma Process Module

Single wafer
Up to 8"
Safety standards
SEMI S2 and S8
ALD processes
AlN, Si3N4, SiO2, Al2O3 (Others and metals to be released)
Processing temperature
Up to 420 °C
Liquid source lines
4
Plasma gas lines
N2, H2, O2, NH3
Plasma pretreatment
Yes
Ammonia (NH3) gas line
Yes
Ozone gas line
Optional
Process control
Recipe-based; fully configurable
BENEQ Transform™ and Transform™ Lite Product BrochureDownload

Related Stories

i-Micronews
News |

Further expansion of ALD applications in More-than-Moore markets

ALD is used today in high-volume manufacturing for mainstream memory applications. Attracted by their healthy growth and the benefits over…

Read more
News |

Beneq unveils Transform™, a versatile automated ALD platform

The brand-new cluster design offers customers unparalleled flexibility by combining both thermal and plasma ALD with single wafer and batch processing, on a single automated platform.

Read more
Blog |

Ultimate protection on all levels

Atomic Layer Deposition (ALD) is an unmatchable moisture barrier and encapsulation solution for electronics and semiconductor components. The ultra-thin ALD moisture protection can be applied in different phases of the production process: wafer-level, chip-level, package or module-level, and/or Assembled Printed Circuit Board (PCBA) level.

Read more
Blog |

The ultimate barrier

ALD offers the only way to create conformal ultra-thin protective coatings on surfaces with high aspect ratios and complex 3D shapes. ALD is also a great solution for encapsulating sensitive surfaces. Here are 3 of Beneq’s ALD moisture barrier customer cases from the electronics industry.

Read more
Blog |

Throughput Revolution

Beneq is on a mission to introduce ALD to a whole new set of industrial applications. Earlier, we have talked about fast ALD, spatial ALD solutions and next generation ALD equipment that changes the standards of throughput for industrial ALD production. Next, our plan is to start a throughput revolution in ALD for the semiconductor industry.

Read more
Blog |

Wafers for breakfast, lunch and dinner

Today, we would like to talk about how our expertise in high-capacity ALD is benefiting our customers in wafer research and industrial wafer-processing in markets with high throughput requirements, such as the semiconductor, MEMS and LED industries.

Read more

Contact us

Do you have an inquiry?

Contact our team of experts to get more information, request a sample, or ask for a quote.

Contact us
Contact us