Versatile, automated ALD solution for high-throughput production.
Beneq Transform™
Beneq Transform™ Lite
One platform, multiple configurations.
Beneq Transform™ establishes a completely new class of ALD cluster tool products in it’s versatility and adaptability to address a broad range of applications and market segments. Beneq Transform™ configure with multiple ALD process modules to meet a specific wafer capacity requirement or be later upgraded in response to growing volumes or with new ALD applications.
PEALD
Thermal
Thermal and Plasma ALD in one.
Single wafer or batch processing. Widest range of high-performance oxides and nitrides. Maximize your options for flexible volume production. With its flexible automation platform and unique capability to combine both thermal batch and plasma enhanced ALD process modules in one integrated system, Beneq Transform™ offers unparalleled flexibility in how processing sequences can be realized to meet the most demanding thin-film deposition requirements.
Designed for the fab.
Industry-standard horizontal wafer loading offers plug-and-play integration. A unique preheating module eliminates waiting time and boosts throughput to a whole new level.
SEMI certified.
Fully compliant with SEMI S2/S8 and SECS/GEM standards. Customized support ensures a smooth transition to ALD in production.
The brand-new cluster design offers customers unparalleled flexibility by combining both thermal and plasma ALD with single wafer and batch processing, on a single automated platform.
Atomic Layer Deposition (ALD) is an unmatchable moisture barrier and encapsulation solution for electronics and semiconductor components. The ultra-thin ALD moisture protection can be applied in different phases of the production process: wafer-level, chip-level, package or module-level, and/or Assembled Printed Circuit Board (PCBA) level.
ALD offers the only way to create conformal ultra-thin protective coatings on surfaces with high aspect ratios and complex 3D shapes. ALD is also a great solution for encapsulating sensitive surfaces. Here are 3 of Beneq’s ALD moisture barrier customer cases from the electronics industry.
Beneq is on a mission to introduce ALD to a whole new set of industrial applications. Earlier, we have talked about fast ALD, spatial ALD solutions and next generation ALD equipment that changes the standards of throughput for industrial ALD production. Next, our plan is to start a throughput revolution in ALD for the semiconductor industry.
Today, we would like to talk about how our expertise in high-capacity ALD is benefiting our customers in wafer research and industrial wafer-processing in markets with high throughput requirements, such as the semiconductor, MEMS and LED industries.
