Versatile, automated ALD solution for high-throughput production.
The BENEQ Transform™ is a full automated, production-ready ALD solution for power electronics, MEMS and sensors, RF, LED, photonics, and encapsulation applications. Its proprietary preheating module eliminates hours of waiting time and boosts throughput to a whole new level: 15 wafers per hour @50 nm Al2O3, in thermal mode. Throughput can be further increased by adding up to 2 more process modules, thermal or plasma.
The BENEQ Transform™ Lite offers the same thermal, plasma and preheating modules as the larger Transform™. It works well for R&D, prototyping, as well as volume production. It is capable of surface pre-treatment and can coat substrate materials at wafer sizes from 3 to 8 inches. With the BENEQ Transform™ Lite customers can now run several different ALD processes on multiple devices and applications, all on a single footprint!
Truly versatile.
Thermal and plasma ALD. Single wafer or batch processing. Widest range of high-performance oxides and nitrides. Maximize your options for flexible volume production.
Designed for the fab.
Industry-standard horizontal wafer loading offers plug-and-play integration. A unique preheating module eliminates waiting time and boosts throughput to a whole new level.
SEMI certified.
Fully compliant with SEMI S2/S8 and SECS/GEM standards. Customized support ensures a smooth transition to ALD in production.
The brand-new cluster design offers customers unparalleled flexibility by combining both thermal and plasma ALD with single wafer and batch processing, on a single automated platform.
Atomic Layer Deposition (ALD) is an unmatchable moisture barrier and encapsulation solution for electronics and semiconductor components. The ultra-thin ALD moisture protection can be applied in different phases of the production process: wafer-level, chip-level, package or module-level, and/or Assembled Printed Circuit Board (PCBA) level.
ALD offers the only way to create conformal ultra-thin protective coatings on surfaces with high aspect ratios and complex 3D shapes. ALD is also a great solution for encapsulating sensitive surfaces. Here are 3 of Beneq’s ALD moisture barrier customer cases from the electronics industry.
Beneq is on a mission to introduce ALD to a whole new set of industrial applications. Earlier, we have talked about fast ALD, spatial ALD solutions and next generation ALD equipment that changes the standards of throughput for industrial ALD production. Next, our plan is to start a throughput revolution in ALD for the semiconductor industry.
Today, we would like to talk about how our expertise in high-capacity ALD is benefiting our customers in wafer research and industrial wafer-processing in markets with high throughput requirements, such as the semiconductor, MEMS and LED industries.
