Products

Wafer fab equipment

Automated ALD solutions for high-volume wafer production. The BENEQ Transform™ offers both batch and plasma processing and a unique preheating module. Our wafer fab equipment is perfectly suited for high-volume manufacturing in various wafer-based applications, including MEMS, power devices, photonics, OLED and more.


BENEQ Transform™

The BENEQ Transform™ is a one-stop, production-ready ALD solution for power electronics, MEMS and sensors, RF, LED, photonics, and encapsulation applications. It offers both thermal and plasma ALD modules and is capable of single or batch processing. Its proprietary preheating module eliminates hours of waiting time and boosts throughput to a whole new level: 15 wafers per hour @50 nm Al2O3, in thermal mode. Throughput can be further increased by adding up to 2 more process modules, thermal or plasma.

See product

BENEQ Transform™ Lite

Maximize versatility as volume scales. The BENEQ Transform™ Lite offers the same thermal, plasma and preheating module as the larger Transform™. It works well for R&D, prototyping, as well as volume production. It is capable of surface pre-treatment and can coat substrate materials at wafer sizes from 3 to 8 inches. With the BENEQ Transform™ Lite customers can now run several different ALD processes on multiple devices and applications, all on a single footprint!

See product

Beneq C2R

Wafer plasma batch processing is revolutionized through spatial ALD. By doing away with pulsing and purging of precursors, the substrate rotates through various reactive and purging zones to achieve unparalleled throughput and simplicity.

See product

Comparison

Which product is for you

Product Transform Lite Transform C2R
Dimensions 3000 x 1200 x 1950 mm 3000 x 3000 x 1950 mm 3784 x 1350 x 1950 mm
Chamber Volume 200 mm x 25 wafers 200 mm x 25 wafers 200 mm x 7 wafers
Usage Production Production Production
Integration Cluster, up to 2 ALD modules Cluster, up to 3 ALD modules Cluster, stand alone ALD module
Wafer Prep Module (Pre-heater) Yes Yes No
Temperature Range 25 – 400 C 25 – 400 C 25 – 200 C
Product Transform Lite
Dimensions 3000 x 1200 x 1950 mm
Chamber Volume 200 mm x 25 wafers
Usage Production
Integration Cluster, up to 2 ALD modules
Wafer Prep Module (Pre-heater) Yes
Temperature Range 25 – 400 C
Transform™ Lite
Product Transform
Dimensions 3000 x 3000 x 1950 mm
Chamber Volume 200 mm x 25 wafers
Usage Production
Integration Cluster, up to 3 ALD modules
Wafer Prep Module (Pre-heater) Yes
Temperature Range 25 – 400 C
Transform™
Product C2R
Dimensions 3784 x 1350 x 1950 mm
Chamber Volume 200 mm x 7 wafers
Usage Production
Integration Cluster, stand alone ALD module
Wafer Prep Module (Pre-heater) No
Temperature Range 25 – 200 C
C2R

Contact us

Do you have an inquiry?

Contact our team of experts to get more information, request a sample, or ask for a quote.

Contact us