Spatial ALD Equipment

Beneq WCS 600

Beneq WCS 600 is a roll-to-roll atomic layer deposition system for R&D and pilot production.

2060x 2340 x 2150 mm

Dimensions

R&D/Production

Usage

Up to 10 m/min

Web speed

Up to 150 ºC

Process temperature range

Process type
Thermal spatial ALD
Single-sided coating
Usage
R&D
Production
Substrate type
Polymer
Metal
Flexible glass
Width up to 625 mm
Web speed
Up to 10 m/min
Main dimensions
2060x 2340 x 2150 mm
Integration
Stand-alone
Line integrated
Process temperature range
Up to 150 ºC
Substrate size (web width)
Up to 625 mm
Substrate material
flexible web such as polymer, metal, glass or paper
Web speed
0.05 – 10 m / min
Roll weight
Up to 30 kg
Dynamic deposition weight
10 nm*m / min (for AI2O3)
Control system
PLC control with PC user interface
Main dimensions, ALD system (L × W × H)
2060 × 2340 × 2150 mm
Main dimensions, Precursor Delivery System (L × W × H)
1750 × 800 × 1530 mm
Main dimensions, electrical cabinet (L × W × H)
1010 × 320 × 1220 mm

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