Beneq WCS 600 is a roll-to-roll atomic layer deposition system for R&D and pilot production.
Industrial scale R2R ALD system
Beneq WCS 600 is a roll-to-roll atomic layer deposition system for R&D and pilot production. The system is uniquely suited for demanding thin-film applications in AMOLED displays, OLED lighting, flexible photovoltaics, battery, and coating of flexible glass.
Continuous deposition of high quality ALD film onto rolls of flexible substrates such as polymer, metal or paper
Low processing temperature (< 150 C) for sensitive substrates
Wide operating pressure range for easy line integration
System deposition speed is highly scalable, reaching 10 m/min speeds
Coupled with the continuous development of precursors, ALD can be used to deposit a wide variety of materials at many different conditions, which opens the possibility for applications to a huge range of substrates.
Our products for industrial customers who require low cost in high volume manufacturing include the Beneq R11 rotary ALD system and the Beneq WCS 600 Roll-to-Roll ALD system. Beneq also offers several tools for wafer processing, such as the Beneq T2S batch wafer tool.
On Wednesday, December 11, Beneq received a special commercialization breakthrough award from Tekes, the Finnish funding agency for technology and innovation, as part of its six-year-long Functional Materials program.
