Research Equipment
Beneq R2
Compact, scalable. Your perfect ALD research partner at EUR 130 000.
1200 x 600 x 1630
Dimensions
4
Liquid sources
500 kg
Weight
1 or 3
Gas sources
Main dimensions
1200mm x 600mm x 1630mm (W x D x H)
Weight
500 kg
Liquid Sources
Number of sources
4
Container volume
50 ml
Temperature range
RT…40 ºC
Plasma chamber
200 mm x 3 mm (effective diameter x height)
Particle coating chamber
Flow-through chamber, gross volume 58 ml
Reaction Chamber
Operating temperature range
50…400 ºC
Single wafer chamber
200 mm x 3 mm (effective diameter x height)
Wafer batch/3D chamber
200 mm x 95 mm (effective diameter x height)
Plasma chamber
200 mm x 3 mm (effective diameter x height)
Particle coating chamber
Flow-through chamber, gross volume 58 ml
Vacuum Chamber
Heating method
Internal resistive tube heaters with IR reflectors
Cooling method
Air cooling
Heated Sources (Optional)
Number of sources
2
Container volume
200 ml
Temperature range
RT…200 ºC
Gas Sources (Optional)
Number of sources
1 or 3
Plasma ALD (Optional)
Principle of operation
Capacitively coupled plasma at 13.56 MHz
Power
300 W
Number of plasma gases
2
Reduced-Flow High-Aspect Ratio (Optional)
Principle of operation
Controlled reduction of exhaust flow to enhance precursor diffusion to high-aspect ratio structures
