Research Equipment

Beneq R2

Compact, scalable. Your perfect ALD research partner at EUR 130 000.

1200 x 600 x 1630

Dimensions

4

Liquid sources

500 kg

Weight

1 or 3

Gas sources

Main dimensions
1200mm x 600mm x 1630mm (W x D x H)
Weight
500 kg

Liquid Sources

Number of sources
4
Container volume
50 ml
Temperature range
RT…40 ºC
Plasma chamber
200 mm x 3 mm (effective diameter x height)
Particle coating chamber
Flow-through chamber, gross volume 58 ml

Reaction Chamber

Operating temperature range
50…400 ºC
Single wafer chamber
200 mm x 3 mm (effective diameter x height)
Wafer batch/3D chamber
200 mm x 95 mm (effective diameter x height)
Plasma chamber
200 mm x 3 mm (effective diameter x height)
Particle coating chamber
Flow-through chamber, gross volume 58 ml

Vacuum Chamber

Heating method
Internal resistive tube heaters with IR reflectors
Cooling method
Air cooling

Heated Sources (Optional)

Number of sources
2
Container volume
200 ml
Temperature range
RT…200 ºC​

Gas Sources (Optional)

Number of sources
1 or 3

Plasma ALD (Optional)

Principle of operation
Capacitively coupled plasma at 13.56 MHz​
Power
300 W​
Number of plasma gases
2

Reduced-Flow High-Aspect Ratio (Optional)

Principle of operation
Controlled reduction of exhaust flow to enhance precursor diffusion to high-aspect ratio structures​​
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