Beneq TFS 200 Options
ALD research equipment that grows with you
Beneq TFS 200 ALD equipment is a research platform that can be expanded to fit your research needs. The available options and upgrades support the versatility and modularity of the Beneq TFS 200 equipment and improve the efficiency of the ALD process.
The easiest way to get an offer for Beneq TFS 200 options is to fill in the Beneq TFS 200 option quote form.
Read more about some of our available upgrades and options.
Contact our sales team to hear more about all available options and upgrades for your TFS 200 ALD equipment.
Fluidized Bed Reactor (FBR) is a versatile particle coating option for Beneq TFS 200. The FBR particle coating chamber is easily mounted onto the Beneq TFS 200 vacuum chamber. The FBR coating option allows truly conformal coating of fine powders. A chamber-in-chamber design provides highest process versatility and coating quality. The convenient size of the removable coating chamber simplifies loading and unloading of the powders.
Beneq has a series of reaction chambers specifically designed for coating of demanding High Aspect Ratio (HAR) substrates. From surfaces with curves and holes to the most demanding HAR imaginable, you can control the precursor dwelling time without limits, allowing permeation to the most difficult corners of the most challenging cavities. Beneq TFS 200 enables coating inside nanotubes, filters, ceramics and pores. It will take your ALD to a whole new level, creating great opportunities for material science and surface properties customization.
Beneq’s liquid source options support the versatility and modularity of the Beneq TFS 200 research platform. More liquid sources enable more processes running simultaneously.
Liquid source line with boosting functionality LS-BL
Improves control over line purging in the non-heated precursor sources. Excellent for higher vapor pressure liquid precursors.
Liquid source precursor container LS-BL-PC/200
Increase precursor yield, avoid constant refilling of precursors and reduce down time with this container.
Liquid source line with single output line LS-SL
Improves line and process purity and delivers excellent dose with line purging control. Compatible with higher vapor pressure precursors.
Liquid source precursor container LS-SL-PC/200
Increase precursor yield, avoid constant refilling of precursors and reduce down time with the dedicated container for specific precursors.
Liquid source pressure transducer LS-PT
Prevent running out of precursors during ALD runs with this transducer.
Needle valve for dose adjustment NV-HP
Enables high precision dose adjustment during process tuning and saves chemical precursor quantities.
Beneq’s hot source options enable the use of low vapor pressure precursors and open the possibility to integrate more processes to your TFS 200. Compatible with liquid and solid precursors, enables inert precursor depositions, and safe storing and transportation of precursors.
Hot source HS 300
Exceptionally accurate temperature control during ALD runs for precursors that require inert handling.
Dual hot source DHS 300
Similar to HS 300, but enables handling of two hot source precursors.
Hot source precursor container HS 300-PC
For precursors that need heating for adequate chemical dosing. Increases precursor yield and doses.
Particle filter for HS 300
Particle filtration unit for light and very fine powder precursors.
Beneq’s hot source options enable the use of low vapor pressure precursors and open the possibility to integrate more processes to your TFS 200. HS 500 enables the direct transfer of precursors from container to reaction chamber, allowing fast and efficient use of challenging precursors. Excellent for research purposes enabling chemistry research of new precursors with small quantities.
Hot source HS 500
Exceptionally accurate temperature control during ALD runs.
Precursor crucible for HS 500
Container for precursor chemical.
Thermal gas lines enable integration of gaseous precursors to the ALD equipment with high control. Gas lines are used for pulsing thermal ALD and gaseous precursors into the reaction chamber. Three safety levels available for matching the gas line specifications with local and facility safety rules and requirements.
Gas line TGL-1, TGL-2 and TGL-3
Beneq ozone line and generator options allow ozone gas to be used in thermal ALD depositions. The ozone line option incorporates a gas cabinet that includes an ozone generator, flow adjustment devices, ozone reservoir and destructor.
Ozone line option
Full cabinet assembly for generating ozone gas for ALD deposition
Analyzer for measuring ozone concentration, enabling higher control of your process parameters.
Beneq offers several reactor chamber options for various samples and sample sizes. All chamber options support highly controlled ALD, excellent thin film uniformity and precise precursor dosing. Chambers are interchangeable, they are easy to assemble and quick to install. This unique feature enables multi-user, multi-process use of TFS 200, making it a sound investment which can be used without fear of any cross contamination.
An integrated load lock allows for maximal purity in the process and minimal heat loss from the reaction chamber. Load locks minimize the heat loss from the reaction chamber while substrates are being loaded and unloaded. A load lock is required for certain chemistries in which a very high level of purity is needed.
The Plasma Enhanced ALD (PEALD) options enable new processes, for example processes which usually require low temperature deposition and/or high-speed processing. This upgrade will allow you to run PEALD and ALD in one tool, with ease of use, enhancing the versatility of your TFS 200.
Plasma option PO-200
PEALD is immensely useful to achieve depositions on temperature sensitive substrates such as polymers. This full option includes plasma head PH-200, plasma matching box, plasma generator, plasma carrier gas line with mass flow controller (MFC) and plasma generator rack.
Plasma reaction chamber PRC-200
Low volume reaction chamber design enables fast purging and high deposition rates.
Encapsulation of OLED microdisplaysBeneq developed a thin-film encapsulation nanolaminate coating for a leading Asian OLED microdisplay manufacturer to enable long lifetime for their microdisplays.
Insulator for thin film electroluminescent displaysAn ALD nanolaminate film was developed for Lumineq displays to create a fully pin-hole free thin film insulator layer.
Top electrode for transparent displayBeneq developed an ALD Transparent Conductive Oxide (TCO) for Lumineq's electroluminescent displays to replace the sputtered IDO that was used in the transparent top electrode.
Moisture protection of PCBsBeneq developed a low-temperature ALD moisture barrier solution for a leading supplier of electronics for personal safety monitoring to protect the sensitive circuit board components from moisture.
Encapsulation of phosphor powderBeneq provided a moisture barrier solution using ALD for FBR (fluidized-bed reactor) for a leading phosphor material manufacturer to protect the sensitive phosphor powders used in LED lighting from moisture.
Anti-corrosion coating for LED packagingBeneq's ALD coating solution solved a leading LED manufacturer's silver reflector corrosion problem by both applying ALD to coat the semi-finished wire-bonded LED assemblies, and by protecting the silver surface with nSilver.
Anti-reflection coating for solar glassBeneq and DSM created a production scale solution using DSM AR coating material and Beneq nFOG aerosol technology for a leading solar glass manufacturer to reduce light reflection on solar panels.
Metal-like coatings for watch partsBeneq developed a thin ALD-based optical coating for a leading watch parts manufacturer to both provide a specific color and to protect from corrosion.
Wafer-level moisture barrier for LEDBeneq provided moisture coating using TFS 200 for a leading LED manufacturer to protect LED dies from moisture and prevent oxidation.
Bottom DBR for LEDBeneq developed a multi-layer DBR structure on a patterned surface for a leading LED manufacturer.
Filling of diffractive gratingsBeneq used ALD coating to fill diffractive gratings for a leading optical system manufacturer to keep the gratings free from debris and boost their optical performance.
Anti-corrosion coating for sensorsThe highly conformal and pin-hole free ALD coating solved a leading sensor manufacturer's sensor corrosion problems without compromising sensor sensitivity.
Buffer layer for CIGS solar panelBeneq developed a thin, cadmium-free ALD buffer for the solar panels of a leading CGIS solar panel manufacturer.
Diffusion barrier for Li-ion batteriesBeneq's ultra-thin ALD coating solved a leading Li-ion battery manufacturer's battery corrosion challenges by reducing the fading of battery capacity caused by repeated charge and unload cycles.
Anti-tarnishing coating for jewelryBeneq helped Kalevala Jewelry in preventing the discoloration of silver surfaces by providing the patented nSilver industrial-scale protection solution for an ultra-thin, totally conformal, and fully transparent anti-tarnish coating.
Optical NIR filter on a glass cylinderBeneq developed a customized batch ALD process for a CCD sensor -based industrial vision systems supplier to coat their near-infrared (NIR) filters.
Optical coatings for lenses in high power lasersBenq developed a conformal high- and low-index multilayer optical coating for a leading provider of high power laser optics and coatings using the TFS 500 batch ALD system.
Coating of Microchannel Plates (MCP)Beneq developed an ALD coating solution for microchannel plates (MCP) for Incom, Inc., the world’s largest supplier of rigid fused fiber optics, to allow for significantly greater secondary electron emission .
Thin-film encapsulation of OLED lightingBeneq developed a conformal, dense, and pinhole-free Al2O3 and TiO2 barrier coating for a leading OLED lighting panel manufacturer to protect OLED panels from humidity.
Thin-film encapsulation of scintillator plates for X-ray imagingBeneq developed a conformal, dense, and pinhole-free low temperature Al2O3 and TiO2 barrier coating for a leading scintillator plate manufacturer to protect scintillator materials from moisture and increase product lifetime and reliability.