PRODUCTS

Batch Production

Largest scale, general purpose ALD production systems ideal for coating diverse substrate types and thick films. Easily scale up ALD deposition from the R&D phase to full manufacturing.


Beneq P400A

Built with reliability in mind, the P400A is the result of more than 20 years of ALD production experience. The P400A decouples pressure relations by using a single mass flow controller with carrier gas distribution solely by orifices. By using only solenoid type valves, ALD dosing is fast and repeatable

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Beneq P800

The industry standard for ALD coating of large batches and parts. Capable of ALD processes of metal oxides, rare earth oxides, nitrides, sulfides and carbides. Large enough to accomodate a variety of reactions chambers for best uniformity regardless of sample size. Patented dosing valves and Beneq’s unique backsuction feature prevent any precursor leak to the reaction chamber.

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Beneq P1500

The world’s largest ALD reactor. Uniquely designed to coat very wide area substrates and large batches of 3D components. Equipped with high-capacity precursor sources, rotatable reaction chambers, and optional pre-heating oven for ALD on the biggest scale.

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Comparison

Which product is for you

Product P400A P800 TFS 500 Transform™ Lite
Dimensions 2400 × 930 × 2420 mm 3200 × 1340 × 2460 mm 1600 × 900 × 1930 mm 3000 x 1200 x 1950 mm
Chamber Volume 250 x 250 x 700 mm 600 x 300 x 800 mm 200 x 170 mm (diameter x height) 200 mm x 25 wafers
Usage Production Production R&D, Production Production
Integration Stand-alone Stand-alone Cluster Cluster
Temperature range 50 – 500 °C 50 – 500 °C 25 – 500 °C 25 – 400 °C
Product P400A
Dimensions 2400 × 930 × 2420 mm
Chamber Volume 250 x 250 x 700 mm
Usage Production
Integration Stand-alone
Temperature range 50 – 500 °C
P400A
Product P800
Dimensions 3200 × 1340 × 2460 mm
Chamber Volume 600 x 300 x 800 mm
Usage Production
Integration Stand-alone
Temperature range 50 – 500 °C
P800
Product TFS 500
Dimensions 1600 × 900 × 1930 mm
Chamber Volume 200 x 170 mm (diameter x height)
Usage R&D, Production
Integration Cluster
Temperature range 25 – 500 °C
TFS 500
Product Transform™ Lite
Dimensions 3000 x 1200 x 1950 mm
Chamber Volume 200 mm x 25 wafers
Usage Production
Integration Cluster
Temperature range 25 – 400 °C
Transform™
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