Beneq TFS 500
Thin Film System for ALD research and batch production
The TFS 500 is designed for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its case as a versatile tool for both in-depth thin film research and robust batch processing. The TFS 500 is an ideal tool for multi-project environments.
The TFS 500 can handle several types of substrates; wafers, planar objects, particles and porous bulk materials, as well as complex 3D objects with high aspect ratio features. It can further be equipped with a manually operated load lock for increased wafer processing capabilities. Different types of reaction chambers can easily be fitted inside the vacuum chamber, which in turn enables optimizing each reaction chamber for each customer application.
The TFS 500 meets both the stringent requirements of industrial reliability and the need for flexibility of R&D operations. Process components are off-the-shelf articles, which ensures spare parts availability. All precursor containers can easily be changed, at short notice. The precursor readiness includes gases, liquids and solid materials. For full flexibility in precursor selection, we have additionally included a 500 °C hot source option.
Since 2014, Beneq has been working with MBRAUN to address the growing OLED market needs by offering turn-key R&D solutions. The goal of the collaboration is to combine the acknowledged know-how of Beneq’s breakthrough thin-film encapsulation technology with MBRAUN’s gloveboxes, customized enclosures and standalone units.
- Process cycle time predominantly less than 2 seconds. In many cases, less than 1 second (with uniformity variation < ±1% for, e.g., Al2O3).
- Hot source versatility, up to 500 °C hot source setups as standard options
- Application-specific reaction chamber designs
- Direct and remote CCP plasma ALD as standard options
- Different reaction chambers available for, e.g., wafer, multiple wafer, 3D and powder substrates
- Modular design allows for easy change of reaction chambers, sources and tubing
- High deposition pressures possible for large surface area substrates
- Load lock with manual operation available for rapid substrate wafer change
- Hot-wall reaction chamber for uniform substrate temperature and to prevent precursor condensation and secondary reactions
- Cold-wall vacuum chamber for rapid heating and cooling
- Auxiliary entry ports in vacuum chamber for, in situ diagnostics etc.
- Clean-room compatible
|Process temperature range||25 - 500 °C|
|Reaction chamber types and dimensions|| - single wafer: ø200 × 3 (mm)
ø300 × 25 (mm)
- single wafer plasma: ø200 × 3 (mm)
ø300 × 3 (mm)
- 3D/batch of wafers: ø200 × 170 (mm)
- 3D/batch: 450 × 300 × 250 (mm)
- powder: ø80 × 50 (mm)
- solar cell batch: 156 × 156 (mm), 100 pcs
|Gas lines||up to 5|
|Liquid sources (+5 °C to ambient)||up to 4|
|Hot source HS 300 (ambient to 300 °C)||up to 4|
|Hot source HS 500 (ambient to 500 °C)||up to 2|
|Optional|| - CCP plasma source (capacitively coupled)
- manual load lock
|Control system||PLC control with PC user interface|
|Main dimensions (L × W × H)||1600 × 900 × 1930 (mm)|
Encapsulation of OLED microdisplaysBeneq developed a thin-film encapsulation nanolaminate coating for a leading Asian OLED microdisplay manufacturer to enable long lifetime for their microdisplays.
Insulator for thin film electroluminescent displaysAn ALD nanolaminate film was developed for Lumineq displays to create a fully pin-hole free thin film insulator layer.
Top electrode for transparent displayBeneq developed an ALD Transparent Conductive Oxide (TCO) for Lumineq's electroluminescent displays to replace the sputtered IDO that was used in the transparent top electrode.
Moisture protection of PCBsBeneq developed a low-temperature ALD moisture barrier solution for a leading supplier of electronics for personal safety monitoring to protect the sensitive circuit board components from moisture.
Encapsulation of phosphor powderBeneq provided a moisture barrier solution using ALD for FBR (fluidized-bed reactor) for a leading phosphor material manufacturer to protect the sensitive phosphor powders used in LED lighting from moisture.
Anti-corrosion coating for LED packagingBeneq's ALD coating solution solved a leading LED manufacturer's silver reflector corrosion problem by both applying ALD to coat the semi-finished wire-bonded LED assemblies, and by protecting the silver surface with nSilver.
Anti-reflection coating for solar glassBeneq and DSM created a production scale solution using DSM AR coating material and Beneq nFOG aerosol technology for a leading solar glass manufacturer to reduce light reflection on solar panels.
Metal-like coatings for watch partsBeneq developed a thin ALD-based optical coating for a leading watch parts manufacturer to both provide a specific color and to protect from corrosion.
Wafer-level moisture barrier for LEDBeneq provided moisture coating using TFS 200 for a leading LED manufacturer to protect LED dies from moisture and prevent oxidation.
Bottom DBR for LEDBeneq developed a multi-layer DBR structure on a patterned surface for a leading LED manufacturer.
Filling of diffractive gratingsBeneq used ALD coating to fill diffractive gratings for a leading optical system manufacturer to keep the gratings free from debris and boost their optical performance.
Anti-corrosion coating for sensorsThe highly conformal and pin-hole free ALD coating solved a leading sensor manufacturer's sensor corrosion problems without compromising sensor sensitivity.
Buffer layer for CIGS solar panelBeneq developed a thin, cadmium-free ALD buffer for the solar panels of a leading CGIS solar panel manufacturer.
Diffusion barrier for Li-ion batteriesBeneq's ultra-thin ALD coating solved a leading Li-ion battery manufacturer's battery corrosion challenges by reducing the fading of battery capacity caused by repeated charge and unload cycles.
Anti-tarnishing coating for jewelryBeneq helped Kalevala Jewelry in preventing the discoloration of silver surfaces by providing the patented nSilver industrial-scale protection solution for an ultra-thin, totally conformal, and fully transparent anti-tarnish coating.
Optical NIR filter on a glass cylinderBeneq developed a customized batch ALD process for a CCD sensor -based industrial vision systems supplier to coat their near-infrared (NIR) filters.
Optical coatings for lenses in high power lasersBenq developed a conformal high- and low-index multilayer optical coating for a leading provider of high power laser optics and coatings using the TFS 500 batch ALD system.
Coating of Microchannel Plates (MCP)Beneq developed an ALD coating solution for microchannel plates (MCP) for Incom, Inc., the world’s largest supplier of rigid fused fiber optics, to allow for significantly greater secondary electron emission .
Thin-film encapsulation of OLED lightingBeneq developed a conformal, dense, and pinhole-free Al2O3 and TiO2 barrier coating for a leading OLED lighting panel manufacturer to protect OLED panels from humidity.
Thin-film encapsulation of scintillator plates for X-ray imagingBeneq developed a conformal, dense, and pinhole-free low temperature Al2O3 and TiO2 barrier coating for a leading scintillator plate manufacturer to protect scintillator materials from moisture and increase product lifetime and reliability.