Beneq R11

Ultra-fast high precision spatial ALD coating

Beneq R11™ takes the Plasma Enhanced ALD (PEALD) process to a fully new level - for the first time, PEALD can be used in high volume manufacturing. Because of the plasma enhanced rotary ALD process, the Beneq R11 is ideal for thick ALD films, even up to micrometer.

Beneq R11 provides an optimal solution for high performance ALD on wafers in industrial applications, such as optical coatings, insulators and barriers.

The Beneq R11 is the ideal product when speed, cost, low process temperature, and the highest possible film quality are the driving factors.

Contact our sales for more information on Beneq R11.

Techical highlights

  •  For barrier, insulation and anti-corrosion applications for MEMS, LED, OLED, photovoltaics, high power semiconductors, sensors, etc
  •  For up to 200 mm wafers and other round or rectangular substrates
  •  Can be equipped with standard wafer automation

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