RECENT ADVANCES IN ALD TECHNOLOGY
High film quality and coating conformality are key drivers for the adoption of ALD processes in the energy, lighting and display industries. Large-area industrial ALD has many interesting new application areas: thin film encapsulation, anti-reflection coatings, surface passivation, buffer layers, flexible moisture barrier films, powder functionalization…
Expanding the target market of atomic layer deposition
To broaden the applicability of ALD technology beyond the mainstream wafer-based microelectronics manufacturing, new innovations in addressing different substrate form factors and higher productivity are required.
In her keynote presentation in the 14th International Baltic Conference on Atomic Layer Deposition a couple of weeks ago, Beneq’s research specialist Dr Emma Salmi shared an overview on recent advances in large-area sheet ALD equipment, roll-to-roll ALD processing, high-capacity wafer ALD systems and powder coating methods that have expanded the target market of ALD thin film coatings.
Download keynotes about advances in ALD technology
Given that we got plenty of downloads when we shared Sami Sneck’s conference presentation recently, we thought we’d keep on feeding the ALD technology enthusiasts amongst our readership and add also Emma’s slides for download. For an outlook on equipment, processes and performance of the latest spatial ALD and fluidized bed reactors, please download Emma’s full keynote presentation.
Emma also held a presentation in the European Conference on Nanofilms 2016 in Bilbao, Spain, last week. If you are in addition interested in surface modification with ALD, you can also download Emma's presentation Atomic Layer Deposition for modification of Surface Properties.
Enjoy! And please do get in touch with us if you want to know more.